Patents by Inventor Frederic Mikell

Frederic Mikell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080280229
    Abstract: A radiation-sensitive composition includes a radically polymerizable component, initiator composition, a radiation absorbing compound, and a polymeric binder having recurring units that are derived from various ethylenically unsaturated polymerizable monomers provided that at least 40 mol % of the recurring units have a tertiary carbon atom in the backbone and the rest of the recurring units have a secondary or quaternary carbon atom in the backbone. This composition can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates that have desired imaging speed and excellent run length without the need for a post-exposure backing step.
    Type: Application
    Filed: May 10, 2007
    Publication date: November 13, 2008
    Inventors: Ting Tao, Shashikant Saraiya, Eric Clark, Frederic Mikell
  • Publication number: 20070128546
    Abstract: Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.
    Type: Application
    Filed: December 1, 2005
    Publication date: June 7, 2007
    Inventors: Shashikant Saraiya, Jayanti Patel, Ting Tao, Kevin Ray, Frederic Mikell, James Mulligan, John Kalamen, Scott Beckley, Eric Clark
  • Publication number: 20060046198
    Abstract: Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl groups substituted with three alkoxy and/or phenoxy groups. The lithographic printing plate precursors additionally comprise an imageable layer over the interlayer.
    Type: Application
    Filed: August 27, 2004
    Publication date: March 2, 2006
    Inventors: Joseph Hunter, Saraiya Shashikant, Ting Tao, Frederic Mikell
  • Patent number: 6352811
    Abstract: A thermal lithographic printing plate, which can be imaged by thermal energy typically by imagewise exposure with an infrared emitting laser, a thermal printing head, etc., is made up of a hydrophilic substrate, and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a solubility inhibiting material and a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is insoluble in the aqueous solution, is ink receptive, and is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The plate is exposed with an infrared laser or a thermal print head, and upon aqueous development of the imaged plate, the exposed portions are removed exposing hydrophilic substrate surfaces receptive to conventional aqueous fountain solutions.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: March 5, 2002
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Jayanti Patel, Shahhikant Saraiya, Celin Savariar-Hauck, Jianbing Huang, Frederic Mikell, Ken-ichi Shimazu, Nishith Merchant