Patents by Inventor Frederic Sanchette
Frederic Sanchette has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9963775Abstract: Multilayer material comprising a zirconium-based substrate covered with a multilayer coating, the multilayer coating comprising metallic layers composed of identical or different substances chosen from chromium, a chromium alloy or a ternary alloy of the Nb—Cr—Ti system. Such a material has improved resistance to oxidation in accident conditions of a nuclear reactor. The invention also relates to a multilayer coating, a part composed wholly or partly of the multilayer material or of the multilayer coating, as well as the method for manufacturing the multilayer material such as for example a magnetron cathodic sputtering process.Type: GrantFiled: October 27, 2014Date of Patent: May 8, 2018Assignee: COMMISARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESInventors: Marion Le Flem, Cédric Ducros, Frédéric Sanchette
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Patent number: 9040141Abstract: This method for texturing a DLC coating comprises depositing a single layer of balls or spheres on the free surface of the DLC coating; dry-etching the DLC coating using oxygen plasma; and lastly, cleaning the surface of said coating by eliminating the balls or spheres.Type: GrantFiled: June 9, 2010Date of Patent: May 26, 2015Assignee: Commissariat a l'Energie Atomique et aux Energies AlternativesInventors: Caroline Chouquet, Cédric Ducros, Jérôme Gavillet, Frédéric Sanchette
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Publication number: 20150050521Abstract: Multilayer material comprising a zirconium-based substrate covered with a multilayer coating, the multilayer coating comprising metallic layers composed of identical or different substances chosen from chromium, a chromium alloy or a ternary alloy of the Nb—Cr—Ti system. Such a material has improved resistance to oxidation in accident conditions of a nuclear reactor. The invention also relates to a multilayer coating, a part composed wholly or partly of the multilayer material or of the multilayer coating, as well as the method for manufacturing the multilayer material such as for example a magnetron cathodic sputtering process.Type: ApplicationFiled: October 27, 2014Publication date: February 19, 2015Inventors: Marion LE FLEM, Cédric DUCROS, Frédéric SANCHETTE
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Patent number: 8367207Abstract: The invention relates to a hydrogenated amorphous carbon coating and to a method for the production thereof. It also relates to devices having such a coating. The method of the invention consists in producing a hydrogenated amorphous carbon coating comprising at least two layers of hydrogenated amorphous carbon, each of said layers having chemical compositions and physical and mechanical properties that are identical, and with thicknesses that are identical or different. The coating of the invention finds many applications, in particular in the mechanical field for parts subject to considerable wear and rubbing problems. It may also be applicable, in particular, in the field of surgical implants and in the MEMS (microelectromechanical systems) field.Type: GrantFiled: October 20, 2008Date of Patent: February 5, 2013Assignees: Commissariat a l'Energie Atomique et aux Energies Alternative, Centre National de la Recherche ScientifiqueInventors: Caroline Chouquet, Cédric Ducros, Frédéric Sanchette
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Patent number: 8318375Abstract: A cathode for an electrochemical reactor including a diffusion layer and a catalyst layer. The cathode has bimetallic or multimetallic nanoparticles, dispersed in direct contact with the diffusion layer, at least one of the metals being chromium (Cr) wholly or partly in oxidized form. The cathode is fabricated by depositing the bimetallic or multimetallic nanoparticles on the diffusion layer by DLI-MOCVD in the presence of O2.Type: GrantFiled: July 25, 2008Date of Patent: November 27, 2012Assignee: Commissariat a l'Energie AtomiqueInventors: Sophie Mailley, Frédéric Sanchette, Stéphanie Thollon, Fabrice Emieux
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Patent number: 8288196Abstract: A process for fabricating a silicon-based thin-film photovoltaic cell, applicable for example in the energy generation field. The fabrication process includes a) depositing a p-doped or n-doped amorphous silicon film, the X-ray diffraction spectrum of which has a line centered at 28° that has a mid-height width, denoted by a, such that 4.7°?a<6.0°, on a substrate.Type: GrantFiled: April 20, 2009Date of Patent: October 16, 2012Assignee: Commissariat a l'Energie Atomique et aux Energies AlternativesInventors: Cedric Ducros, Frederic Sanchette, Christophe Secouard
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Publication number: 20120183731Abstract: This method for texturing a DLC coating comprises depositing a single layer of balls or spheres on the free surface of the DLC coating; dry-etching the DLC coating using oxygen plasma; and lastly, cleaning the surface of said coating by eliminating the balls or spheres.Type: ApplicationFiled: June 9, 2010Publication date: July 19, 2012Applicant: Commissariat A L'Energie Atomique Et Aux Energies AlternativesInventors: Caroline Chouquet, Cédric Ducros, Jérôme Gavillet, Frédéric Sanchette
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Publication number: 20110223711Abstract: A process for fabricating a silicon-based thin-film photovoltaic cell, applicable for example in the energy generation field. The fabrication process includes a) depositing a p-doped or n-doped amorphous silicon film, the X-ray diffraction spectrum of which has a line centered at 28° that has a mid-height width, denoted by a, such that 4.7°?a<6.0°, on a substrate.Type: ApplicationFiled: April 20, 2009Publication date: September 15, 2011Inventors: Cédric Ducros, Frédéric Sanchette, Christophe Secouard
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Publication number: 20110076476Abstract: The invention relates to a hydrogenated amorphous carbon coating and to a method for the production thereof. It also relates to devices having such a coating. The method of the invention consists in producing a hydrogenated amorphous carbon coating comprising at least two layers of hydrogenated amorphous carbon, each of said layers having chemical compositions and physical and mechanical properties that are identical, and with thicknesses that are identical or different. The coating of the invention finds many applications, in particular in the mechanical field for parts subject to considerable wear and rubbing problems. It may also be applicable, in particular, in the field of surgical implants and in the MEMS (microelectromechanical systems) field.Type: ApplicationFiled: October 20, 2008Publication date: March 31, 2011Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUEInventors: Caroline Chouquet, Cédric Ducros, Frédéric Sanchette
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Publication number: 20100187774Abstract: This method for producing a seal barrier for a micro component comprising a stack of two thin sealing layers involves forming a fusible interlayer between two sealing layers, said fusible interlayer having a melting temperature which is lower than that of the two sealing layers and melting said interlayer.Type: ApplicationFiled: December 23, 2009Publication date: July 29, 2010Applicant: Commissariat A L'Energie AtomiqueInventors: Frédéric SANCHETTE, Cédric Ducros, Steve Martin
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Patent number: 7670689Abstract: The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 ?m and more particularly between 100 nm and 1 ?m. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 ?m, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.Type: GrantFiled: October 23, 2006Date of Patent: March 2, 2010Assignee: Commissariat a l'Energie AtomiqueInventors: Denis Camel, Laurent Bedel, Frédéric Sanchette, Cédric Ducros
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Patent number: 7592198Abstract: The invention concerns a method for making a photovoltaic cell based on thin film silicon, which consists in providing a heterojunction by depositing on a support at least one first P— (or N—) doped amorphous silicon layer (13) and a second N— (or P—) doped amorphous silicon layer (14), in crystallizing, at least partly, the at least one first layer (13) using a technology for crystallizing silicon by pulsed electronic beam.Type: GrantFiled: March 20, 2006Date of Patent: September 22, 2009Assignee: Commissariat a l'Energie AtomiqueInventors: Stephanie Huet, Pierre Juliet, Cedric Ducros, Frederic Sanchette
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Publication number: 20090113726Abstract: The invention relates to a method for forming a thin, high hardness coating and devices comprising it. The method of the invention consists in depositing, by magnetron cathode sputtering, a titanium film on at least one surface of a substrate under a partial pressure of argon of 1 Pa, then in depositing, by magnetron cathode sputtering, a titanium nitride film, onto the film obtained by introducing nitrogen into the cathodic sputtering chamber while maintaining a partial pressure of 1 Pa, and in depositing a film of a composite nanostructured material based on titanium, zirconium, boron and nitrogen onto the film obtained by magnetron cathode sputtering in active co-sputtering mode. The method of the invention can be applied in many fields, and in particular in the mechanical field in order to improve the surface hardness of mechanical components.Type: ApplicationFiled: September 25, 2008Publication date: May 7, 2009Inventors: Cedric DUCROS, Frederic SANCHETTE, Vincent SANZONE
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Publication number: 20090029236Abstract: This cathode for electrochemical reactor comprises a diffusion layer and a catalyst layer. It has bimetallic or multimetallic nanoparticles, dispersed in direct contact with the diffusion layer, at least one of the metals being chromium (Cr) wholly or partly in oxidized form.Type: ApplicationFiled: July 25, 2008Publication date: January 29, 2009Applicant: Commissariat A L'Energie AtomiqueInventors: Sophie Mailley, Frederic Sanchette, Stephanie Thollon, Fabrice Emieux
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Publication number: 20080176357Abstract: The invention concerns a method for making a photovoltaic cell based on thin film silicon, which consists in providing a heterojunction by depositing on a support at least one first P— (or N—) doped amorphous silicon layer (13) and a second N— (or P—) doped amorphous silicon layer (14), in crystallising, at least partly, the at least one first layer (13) using a technology for crystallising silicon by pulsed electronic beam.Type: ApplicationFiled: March 20, 2006Publication date: July 24, 2008Applicant: Commissariat A L'Energie AtomiqueInventors: Stephanie Huet, Pierre Juliet, Cedric Ducros, Frederic Sanchette
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Publication number: 20070207444Abstract: Dental post made of a composite material contains a central core constituted of a resin matrix in which fibres are embedded. The core is surrounded by a sheath. The sheath is free of fibres and contains at least one substance which can make the post radiopaque.Type: ApplicationFiled: March 1, 2007Publication date: September 6, 2007Applicant: Recherches Et Techniques Dentaires - R.T.D.Inventors: Pierre-Luc Reynaud, Manh-Quynh Chu, Frederic Sanchette, Laurent Bedel
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Publication number: 20070116974Abstract: The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 ?m and more particularly between 100 nm and 1 ?m. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 ?m, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.Type: ApplicationFiled: October 23, 2006Publication date: May 24, 2007Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUEInventors: Denis Camel, Laurent Bedel, Frederic Sanchette, Cedric Ducros