Patents by Inventor Frederic Wiss

Frederic Wiss has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing slurry including zirconia particles and a method of using the polishing slurry
    Patent number: 9410063
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: August 9, 2016
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • POLISHING SLURRY INCLUDING ZIRCONIA PARTICLES AND A METHOD OF USING THE POLISHING SLURRY
    Publication number: 20150315441
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Application
    Filed: July 15, 2015
    Publication date: November 5, 2015
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • Polishing slurry including zirconia particles and a method of using the polishing slurry
    Patent number: 9120200
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: September 1, 2015
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • POLISHING SLURRY INCLUDING ZIRCONIA PARTICLES AND A METHOD OF USING THE POLISHING SLURRY
    Publication number: 20120171936
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Application
    Filed: December 28, 2011
    Publication date: July 5, 2012
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss