Patents by Inventor Frederick B. Ammon

Frederick B. Ammon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLATEN CLEANING METHOD
    Publication number: 20130037052
    Abstract: A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.
    Type: Application
    Filed: August 17, 2012
    Publication date: February 14, 2013
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: David Suuronen, Frederick B. Ammon, David Burgdorf, Lyudmila Stone
  • Platen cleaning method
    Patent number: 8268081
    Abstract: A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: September 18, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: David Suuronen, Frederick B. Ammon, David Burgdorf, Lyudmila Stone
  • PLATEN TO CONTROL CHARGE ACCUMULATION
    Publication number: 20110036990
    Abstract: An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided.
    Type: Application
    Filed: August 12, 2009
    Publication date: February 17, 2011
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Dale K. Stone, Lyudmila Stone, Julian G. Blake, Frederick B. Ammon, David E. Suuronen
  • Platen Cleaning Method
    Publication number: 20100083980
    Abstract: A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.
    Type: Application
    Filed: October 2, 2008
    Publication date: April 8, 2010
    Inventors: David Suuronen, Frederick B. Ammon, David Burgdorf, Lyudmila Stone