Abstract: An imaging device includes a first pixel including a first photoelectric conversion region and a first amplification transistor, a second pixel adjacent the first pixel and including a second photoelectric conversion region and a second amplification transistor, and a first contact coupled to the first amplification transistor and the second amplification transistor, and that receives a power supply signal for the first amplification transistor and the second amplification transistor.

Abstract: Color image sensors and systems are provided. A color image sensor as disclosed includes a plurality of pixels disposed within an array, each of which includes a plurality of sub-pixels. A pixel array includes pixel cells, each pixel cell including one or more photodiodes. Pixel cells are arranged in rows and columns. The pixel array includes transistors for vertical binning of pixel cells in different rows and transistors for horizontal binning of pixel cells in different columns.

Abstract: An imaging device includes a plurality of unit pixels or pixels, with each pixel separated from every other unit pixel by an isolation structure. Each unit pixel includes a photoelectric conversion unit, a pixel imaging signal readout circuit, and an address event detection readout circuit. A first transfer transistor selectively connects the photoelectric conversion unit to the pixel imaging signal readout circuit, and a second transfer transistor selectively connects the photoelectric conversion unit to the address event detection readout circuit. The photoelectric conversion unit, the pixel imaging signal readout circuit, the address event detection readout circuit, and the first and second transfer transistors for a given pixel are located within a pixel area defined by the isolation structure. The isolation structure may be in the form of a full thickness dielectric trench isolation structure.

Abstract: An imaging device includes a plurality of unit pixels or pixels, with each pixel separated from every other unit pixel by an isolation structure. Each unit pixel includes a photoelectric conversion unit, a pixel imaging signal readout circuit, and an address event detection readout circuit. A first transfer transistor selectively connects the photoelectric conversion unit to the pixel imaging signal readout circuit, and a second transfer transistor selectively connects the photoelectric conversion unit to the address event detection readout circuit. The photoelectric conversion unit, the pixel imaging signal readout circuit, the address event detection readout circuit, and the first and second transfer transistors for a given pixel are located within a pixel area defined by the isolation structure. The isolation structure may be in the form of a full thickness dielectric trench isolation structure.

Abstract: An imaging device with a plurality of image sensing pixels and a plurality of event detection pixels is provided. Each image sensing pixel includes a photoelectric conversion element and an imaging signal generation readout circuit. The image sensing readout circuit can be shared by a plurality of photoelectric conversion elements. Each event detection pixel includes a photoelectric conversion element and an event detection readout circuit. The event detection readout circuit can be shared by a plurality of photoelectric conversion elements. In addition, the photoelectric conversion element of an event detection pixel can be selectively connected to a shared imaging signal generation readout circuit. The number of image sensing pixels is greater than the number of event detection pixels. In addition, the area of a photoelectric conversion element of an event detection pixel can be greater than the area of a photoelectric conversion element of an image sensing pixel.

Abstract: A light receiving element includes: a first tap; a second tap; a first photoelectric conversion unit configured to detect a charge generated by photoelectric conversion according to a light amount of incident light in accordance with a voltage applied to the first tap; a second photoelectric conversion unit configured to detect a charge generated by photoelectric conversion according to a light amount of the incident light in accordance with a voltage applied to the second tap; a plurality of accumulation units configured to accumulate the charges generated by the first photoelectric conversion unit and the second photoelectric conversion unit; a plurality of transmission units configured to transmit the charges generated by the first photoelectric conversion unit and the second photoelectric conversion unit to the plurality of accumulation units; and a calculation unit configured to execute calculation based on the charges accumulated in the plurality of accumulation units.

Abstract: An imaging device includes a first pixel including a first photoelectric conversion region disposed in a first substrate and that converts incident light into first electric charges, and a first readout circuit including a first converter that converts the first electric charges into a first logarithmic voltage signal. The first converter includes a first transistor coupled to the first photoelectric conversion region and a second transistor coupled to the first transistor. The imaging device includes a wiring layer on the first substrate and includes a first level of wirings arranged in a first arrangement overlapping the first photoelectric conversion region and in a second arrangement overlapping the first and second transistors, the second arrangement being different than the first arrangement.

Abstract: An imaging device includes a plurality of unit pixels or pixels, with each pixel separated from every other unit pixel by an isolation structure. Each unit pixel includes a photoelectric conversion unit, a pixel imaging signal readout circuit, and an address event detection readout circuit. A first transfer transistor selectively connects the photoelectric conversion unit to the pixel imaging signal readout circuit, and a second transfer transistor selectively connects the photoelectric conversion unit to the address event detection readout circuit. The photoelectric conversion unit, the pixel imaging signal readout circuit, the address event detection readout circuit, and the first and second transfer transistors for a given pixel are located within a pixel area defined by the isolation structure. The isolation structure may be in the form of a full thickness dielectric trench isolation structure.

Abstract: An imaging device includes a first pixel. The first pixel includes a first photoelectric conversion region disposed in a first substrate and that converts incident light into first electric charges. The first pixel includes a first readout circuit including a first converter that converts the first electric charges into a first logarithmic voltage signal. The imaging device includes at least one bonding pad on the first substrate and in electrical contact with the first converter. The at least one bonding pad overlaps at least part of the first pixel.

Abstract: An imaging device includes a plurality of unit pixels disposed into pixel groups that are separated from one another by isolation structures. Unit pixels within each pixel group are separated from one another by isolation structures and share circuit elements. The isolation structures between pixel groups are full thickness isolation structures. At least a portion of the isolation structures between unit pixels within a pixel group are deep trench isolation structures.

Abstract: An imaging device includes a pixel array including a plurality of pixels. Each pixel includes a photoelectric conversion region that converts incident light into electric charge, and a first transfer transistor coupled to a first floating diffusion and the photoelectric conversion region. The imaging device includes a first driving circuit to control the plurality of pixels in an imaging mode to generate a color image, and a second driving circuit to control the plurality of pixels in a depth mode to generate a depth image.

Abstract: An imaging device includes a first pixel #1 including a first photoelectric conversion region and a first amplification transistor AMPO, a second pixel #2 adjacent the first pixel #1 and including a second photoelectric conversion region and a second amplification transistor AMP1, and a first contact C1 coupled to the first amplification transistor AMPO and the second amplification transistor AMP1, and that receives a power supply signal VDD for the first amplification transistor and the second amplification transistor. That is, neighboring pixels in a same row share a VDD contact. A wiring may connect the VDD nodes of amplification transistors AMP for an entire row of pixels. Reset transistors RSTO and RST1, and overflow transistors OFG of each pixel #1 and #2 may be connected to a same power supply. This power supply may be the same or different from the power supply VDD.

Abstract: A pixel array includes a plurality of pixels. Each pixel includes a photoelectric conversion region that converts incident light into electric charge, and a charge transfer section coupled to the photoelectric conversion region and having line symmetry along a first axis in a plan view. The charge transfer section includes a first transfer transistor coupled to a first floating diffusion and the photoelectric conversion region and located at a first side of the photoelectric conversion region, and a second transfer transistor coupled to a second floating diffusion and the photoelectric conversion region and located at the first side of the photoelectric conversion region.

Abstract: An imaging device includes a first pixel. The first pixel includes a first photoelectric conversion region, and first, second, third, and fourth transistors coupled to the first photoelectric conversion region and that transfer charge from the first photoelectric conversion region. In a plan view, gates of the first, second, third, and fourth transistors are arranged at a periphery of the first photoelectric conversion region in a first symmetrical pattern.

Abstract: An imaging device includes a first pixel 51A including a first transfer transistor and a second transfer transistor. The imaging device includes a second pixel 51B adjacent to the first pixel and including a third transfer transistor and a fourth transfer transistor. The imaging device includes a first signal line SL0 coupled to the first transfer transistor that receives a first transfer signal having a first phase of 0 degrees, a second signal line SL180 coupled to the second transfer transistor and that receives a second transfer signal having a second phase of 180 degrees, a third signal line SL90 coupled to the third transfer transistor and that receives a third transfer signal having a third phase of 90 degrees, and a fourth signal line SL270 coupled to the fourth transfer transistor and that receives a fourth transfer signal having a fourth phase of 270 degrees.

Abstract: An imaging device includes a first pixel. The first pixel includes a first photoelectric conversion region, and first and second transistors coupled to the first photoelectric conversion region to transfer charge generated by the first photoelectric conversion region. The imaging device includes a first driving circuit and a second driving circuit to drive the first pixel in a first mode and a second mode, the first mode being a mode in which the first driving circuit applies a first set of transfer signals to the first and second transfer transistors, the second mode being a mode in which the second driving circuit applies a transfer signal to only one of the first and second transfer transistors.

Abstract: An imaging device includes a pixel including a photoelectric conversion region, a first transfer transistor coupled to the photoelectric conversion region, a first floating diffusion, a second floating diffusion, a second transfer transistor coupled between the first floating diffusion and the second floating diffusion to control access to the second floating diffusion, a third transfer transistor coupled to the photoelectric conversion region, a third floating diffusion coupled, a fourth floating diffusion, and a fourth transfer transistor coupled between the third floating diffusion and the fourth floating diffusion to control access to the fourth floating diffusion. The imaging device includes a first wiring layer including a first wiring connected to the second floating diffusion, a second wiring connected to the fourth floating diffusion, and a third wiring connected to ground and capacitively coupled with the first wiring and the second wiring.

Abstract: An imaging device includes a plurality of unit pixels or pixels, with each pixel separated from every other unit pixel by an isolation structure. Each unit pixel includes a photoelectric conversion unit, a pixel imaging signal readout circuit, and an address event detection readout circuit. A first transfer transistor selectively connects the photoelectric conversion unit to the pixel imaging signal readout circuit, and a second transfer transistor selectively connects the photoelectric conversion unit to the address event detection readout circuit. The photoelectric conversion unit, the pixel imaging signal readout circuit, the address event detection readout circuit, and the first and second transfer transistors for a given pixel are located within a pixel area defined by the isolation structure. The isolation structure may be in the form of a full thickness dielectric trench isolation structure.

Abstract: An imaging device with a plurality of image sensing pixels and a plurality of event detection pixels is provided. Each image sensing pixel includes a photoelectric conversion element and an imaging signal generation readout circuit. The image sensing readout circuit can be shared by a plurality of photoelectric conversion elements. Each event detection pixel includes a photoelectric conversion element and an event detection readout circuit. The event detection readout circuit can be shared by a plurality of photoelectric conversion elements. In addition, the photoelectric conversion element of an event detection pixel can be selectively connected to a shared imaging signal generation readout circuit. The number of image sensing pixels is greater than the number of event detection pixels. In addition, the area of a photoelectric conversion element of an event detection pixel can be greater than the area of a photoelectric conversion element of an image sensing pixel.

Abstract: An imaging device includes a plurality of unit pixels or pixels, with each pixel separated from every other unit pixel by an isolation structure. Each unit pixel includes a photoelectric conversion unit, a pixel imaging signal readout circuit, and an address event detection readout circuit. A first transfer transistor selectively connects the photoelectric conversion unit to the pixel imaging signal readout circuit, and a second transfer transistor selectively connects the photoelectric conversion unit to the address event detection readout circuit. The photoelectric conversion unit, the pixel imaging signal readout circuit, the address event detection readout circuit, and the first and second transfer transistors for a given pixel are located within a pixel area defined by the isolation structure. The isolation structure may be in the form of a full thickness dielectric trench isolation structure.