Abstract: A temperature change of a device on an integrated circuit chip due to self-heating and thermal coupling with other device(s) is modeled considering inefficient heat removal from the backside of the chip. To perform such modeling, ratios of an imaginary heat amount to an actual heat amount for different locations on the IC chip must be predetermined using a test integrated circuit (IC) chip. During testing, one test device at one specific location on the test IC chip is selected to function as a heat source, while at least two other test devices at other locations on the test IC chip function as temperature sensors. The heat source is biased and changes in temperature at the heat source and at the sensors are determined. These changes are used to calculate the value of the imaginary heat amount to actual heat amount ratio to be associated with the specific location.

Abstract: Disclosed are embodiments for modeling integrated circuit (IC) performance. In these embodiments, a parasitic extraction process is performed to generate a netlist that, not only accounts for various parasitics within the IC, but also accounts for substrate-generated signal distortions (e.g., substrate-generated harmonic signal distortions) that occur within the IC. During this netlist extraction process, the design layout of the IC is analyzed to identify parasitics that are to be represented in the netlist and to also identify any circuit elements with output signals that are subject to substrate-generated signal distortions. When such circuit elements are identified, signal distortion models, which were previously empirically determined and stored in a model library, which correspond to the identified circuit elements, and which account for the signal distortions, are selected from the model library and incorporated into the netlist.

Abstract: Disclosed are embodiments for modeling integrated circuit (IC) performance. In these embodiments, a parasitic extraction process is performed to generate a netlist that, not only accounts for various parasitics within the IC, but also accounts for substrate-generated signal distortions (e.g., substrate-generated harmonic signal distortions) that occur within the IC. During this netlist extraction process, the design layout of the IC is analyzed to identify parasitics that are to be represented in the netlist and to also identify any circuit elements with output signals that are subject to substrate-generated signal distortions. When such circuit elements are identified, signal distortion models, which were previously empirically determined and stored in a model library, which correspond to the identified circuit elements, and which account for the signal distortions, are selected from the model library and incorporated into the netlist.

Abstract: A temperature change of a device on an integrated circuit chip due to self-heating and thermal coupling with other device(s) is modeled considering inefficient heat removal from the backside of the chip. To perform such modeling, ratios of an imaginary heat amount to an actual heat amount for different locations on the IC chip must be predetermined using a test integrated circuit (IC) chip. During testing, one test device at one specific location on the test IC chip is selected to function as a heat source, while at least two other test devices at other locations on the test IC chip function as temperature sensors. The heat source is biased and changes in temperature at the heat source and at the sensors are determined. These changes are used to calculate the value of the imaginary heat amount to actual heat amount ratio to be associated with the specific location.

Abstract: A temperature change of a device on an integrated circuit chip due to self-heating and thermal coupling with other device(s) is modeled considering inefficient heat removal from the backside of the chip. To perform such modeling, ratios of an imaginary heat amount to an actual heat amount for different locations on the IC chip must be predetermined using a test integrated circuit (IC) chip. During testing, one test device at one specific location on the test IC chip is selected to function as a heat source, while at least two other test devices at other locations on the test IC chip function as temperature sensors. The heat source is biased and changes in temperature at the heat source and at the sensors are determined. These changes are used to calculate the value of the imaginary heat amount to actual heat amount ratio to be associated with the specific location.

Abstract: A temperature change of a device on an integrated circuit chip due to self-heating and thermal coupling with other device(s) is modeled considering inefficient heat removal from the backside of the chip. To perform such modeling, ratios of an imaginary heat amount to an actual heat amount for different locations on the IC chip must be predetermined using a test integrated circuit (IC) chip. During testing, one test device at one specific location on the test IC chip is selected to function as a heat source, while at least two other test devices at other locations on the test IC chip function as temperature sensors. The heat source is biased and changes in temperature at the heat source and at the sensors are determined. These changes are used to calculate the value of the imaginary heat amount to actual heat amount ratio to be associated with the specific location.

Abstract: Disclosed are an interdigitated capacitor and an interdigitated vertical native capacitor, each having a relatively low (e.g., zero) net coefficient of capacitance with respect to a specific parameter. For example, the capacitors can have a zero net linear temperature coefficient of capacitance (Tcc) to limit capacitance variation as a function of temperature or a zero net quadratic voltage coefficient of capacitance (Vcc2) to limit capacitance variation as a function of voltage. In any case, each capacitor can incorporate at least two different plate dielectrics having opposite polarity coefficients of capacitance with respect to the specific parameter due to the types of dielectric materials used and their respective thicknesses. As a result, the different dielectric plates will have opposite effects on the capacitance of the capacitor that cancel each other out such that the capacitor has a zero net coefficient of capacitance with respect to specific parameter.

Abstract: Disclosed are an interdigitated capacitor and an interdigitated vertical native capacitor, each having a relatively low (e.g., zero) net coefficient of capacitance with respect to a specific parameter. For example, the capacitors can have a zero net linear temperature coefficient of capacitance (Tcc) to limit capacitance variation as a function of temperature or a zero net quadratic voltage coefficient of capacitance (Vcc2) to limit capacitance variation as a function of voltage. In any case, each capacitor can incorporate at least two different plate dielectrics having opposite polarity coefficients of capacitance with respect to the specific parameter due to the types of dielectric materials used and their respective thicknesses. As a result, the different dielectric plates will have opposite effects on the capacitance of the capacitor that cancel each other out such that the capacitor has a zero net coefficient of capacitance with respect to specific parameter.

Abstract: Disclosed is a Zener diode having a scalable reverse-bias breakdown voltage (Vb) as a function of the position of a cathode contact region relative to the interface between adjacent cathode and anode well regions. Specifically, cathode and anode contact regions are positioned adjacent to corresponding cathode and anode well regions and are further separated by an isolation region. However, while the anode contact region is contained entirely within the anode well region, one end of the cathode contact region extends laterally into the anode well region. The length of this end can be predetermined in order to selectively adjust the Vb of the diode (e.g., increasing the length reduces Vb of the diode and vice versa). Also disclosed are an integrated circuit, incorporating multiple instances of the diode with different reverse-bias breakdown voltages, a method of forming the diode and a design structure for the diode.

Abstract: Disclosed is a Zener diode having a scalable reverse-bias breakdown voltage (Vb) as a function of the position of a cathode contact region relative to the interface between adjacent cathode and anode well regions. Specifically, cathode and anode contact regions are positioned adjacent to corresponding cathode and anode well regions and are further separated by an isolation region. However, while the anode contact region is contained entirely within the anode well region, one end of the cathode contact region extends laterally into the anode well region. The length of this end can be predetermined in order to selectively adjust the Vb of the diode (e.g., increasing the length reduces Vb of the diode and vice versa). Also disclosed are an integrated circuit, incorporating multiple instances of the diode with different reverse-bias breakdown voltages, a method of forming the diode and a design structure for the diode.

Abstract: Disclosed is a Zener diode having a scalable reverse-bias breakdown voltage (Vb) as a function of the position of a cathode contact region relative to the interface between adjacent cathode and anode well regions. Specifically, cathode and anode contact regions are positioned adjacent to corresponding cathode and anode well regions and are further separated by an isolation region. However, while the anode contact region is contained entirely within the anode well region, one end of the cathode contact region extends laterally into the anode well region. The length of this end can be predetermined in order to selectively adjust the Vb of the diode (e.g., increasing the length reduces Vb of the diode and vice versa). Also disclosed are an integrated circuit, incorporating multiple instances of the diode with different reverse-bias breakdown voltages, a method of forming the diode and a design structure for the diode.

Abstract: Disclosed is a Zener diode having a scalable reverse-bias breakdown voltage (Vb) as a function of the position of a cathode contact region relative to the interface between adjacent cathode and anode well regions. Specifically, cathode and anode contact regions are positioned adjacent to corresponding cathode and anode well regions and are further separated by an isolation region. However, while the anode contact region is contained entirely within the anode well region, one end of the cathode contact region extends laterally into the anode well region. The length of this end can be predetermined in order to selectively adjust the Vb of the diode (e.g., increasing the length reduces Vb of the diode and vice versa). Also disclosed are an integrated circuit, incorporating multiple instances of the diode with different reverse-bias breakdown voltages, a method of forming the diode and a design structure for the diode.

Abstract: A Schottky barrier diode comprises a first-type substrate, a second-type well isolation region on the first-type substrate, and a first-type well region on the second-type well isolation region. With embodiments herein a feature referred to as a perimeter capacitance well junction ring is on the second-type well isolation region. A second-type well region is on the second-type well isolation region. The perimeter capacitance well junction ring is positioned between and separates the first-type well region and the second-type well region. A second-type contact region is on the second-type well region, and a first-type contact region contacts the inner portion of the first-type well region. The inner portion of the first-type well region is positioned within the center of the first-type contact region. Additionally, a first ohmic metallic layer is on the first-type contact region and a second ohmic metallic layer is on the first-type well region.

Abstract: A junction field effect transistor (JFET) in a semiconductor substrate includes a source region, a drain region, a channel region, an upper gate region, and a lower gate region. The lower gate region is electrically connected to the upper gate region. The upper and lower gate regions control the current flow through the channel region. By performing an ion implantation step that extends the thickness of the source region to a depth greater than the thickness of the drain region, an asymmetric JFET is formed. The extension of depth of the source region relative to the depth of the drain region reduces the length for minority charge carriers to travel through the channel region, reduces the on-resistance of the JFET, and increases the on-current of the JFET, thereby enhancing the overall performance of the JFET without decreasing the allowable Vds or dramatically increasing Voff/Vpinch.

Abstract: A Schottky barrier diode comprises a first-type substrate, a second-type well isolation region on the first-type substrate, and a first-type well region on the second-type well isolation region. With embodiments herein a feature referred to as a perimeter capacitance well junction ring is on the second-type well isolation region. A second-type well region is on the second-type well isolation region. The perimeter capacitance well junction ring is positioned between and separates the first-type well region and the second-type well region. A second-type contact region is on the second-type well region, and a first-type contact region contacts the inner portion of the first-type well region. The inner portion of the first-type well region is positioned within the center of the first-type contact region. Additionally, a first ohmic metallic layer is on the first-type contact region and a second ohmic metallic layer is on the first-type well region.

Abstract: A junction field effect transistor (JFET) in a semiconductor substrate includes a source region, a drain region, a channel region, an upper gate region, and a lower gate region. The lower gate region is electrically connected to the upper gate region. The upper and lower gate regions control the current flow through the channel region. By performing an ion implantation step that extends the thickness of the source region to a depth greater than the thickness of the drain region, an asymmetric JFET is formed. The extension of depth of the source region relative to the depth of the drain region reduces the length for minority charge carriers to travel through the channel region, reduces the on-resistance of the JFET, and increases the on-current of the JFET, thereby enhancing the overall performance of the JFET without decreasing the allowable Vds or dramatically increasing Voff/Vpinch.

Abstract: A junction field effect transistor (JFET) in a semiconductor substrate includes a source region, a drain region, a channel region, an upper gate region, and a lower gate region. The lower gate region is electrically connected to the upper gate region. The upper and lower gate regions control the current flow through the channel region. By performing an ion implantation step that extends the thickness of the source region to a depth greater than the thickness of the drain region, an asymmetric JFET is formed. The extension of depth of the source region relative to the depth of the drain region reduces the length for minority charge carriers to travel through the channel region, reduces the on-resistance of the JFET, and increases the on-current of the JFET, thereby enhancing the overall performance of the JFET without decreasing the allowable Vds or dramatically increasing Voff/Vpinch.

Abstract: A junction field effect transistor (JFET) in a semiconductor substrate includes a source region, a drain region, a channel region, an upper gate region, and a lower gate region. The lower gate region is electrically connected to the upper gate region. The upper and lower gate regions control the current flow through the channel region. By performing an ion implantation step that extends the thickness of the source region to a depth greater than the thickness of the drain region, an asymmetric JFET is formed. The extension of depth of the source region relative to the depth of the drain region reduces the length for minority charge carriers to travel through the channel region, reduces the on-resistance of the JFET, and increases the on-current of the JFET, thereby enhancing the overall performance of the JFET without decreasing the allowable Vds or dramatically increasing Voff/Vpinch.

Abstract: A design structure for a metal-insulator-metal (MIM) capacitor using a via as a top plate and method for forming is described. In one embodiment, the MIM capacitor structure comprises a bottom plate and a capacitor dielectric layer formed on the bottom plate and at least one via formed on the capacitor dielectric layer. The at least one via provides a top plate of the MIM capacitor.