Patents by Inventor Frederick G. Storz

Frederick G. Storz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactive sputter etching apparatus
    Patent number: 4309267
    Abstract: An rf sputter etch or reactive sputter etch apparatus which can be used for etching substrates at oblique angles utilizes a cathode formed from a metal grid and an equipotential enclosure. The substrate is supported in the enclosure either parallel to or at an oblique angle to the surface of the grid.
    Type: Grant
    Filed: July 21, 1980
    Date of Patent: January 5, 1982
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Gary D. Boyd, Larry A. Coldren, Frederick G. Storz