Patents by Inventor Frederick Gaillard

Frederick Gaillard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of depositing organosilicate layers
    Patent number: 6573196
    Abstract: A method of forming an organosilicate layer is disclosed. The organosilicate layer is formed by applying an electric field to a gas mixture comprising a phenyl-based silane compound. The gas mixture may optionally include an oxidizing gas. The organosilicate layer is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the organosilicate layer is used as an anti-reflective coating (ARC). In another integrated circuit fabrication process, the organosilicate layer is incorporated into a damascene structure.
    Type: Grant
    Filed: August 12, 2000
    Date of Patent: June 3, 2003
    Assignee: Applied Materials Inc.
    Inventors: Frederick Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh