Patents by Inventor Frederick H. Howell

Frederick H. Howell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4924015
    Abstract: Anthraquinones having .alpha.,.alpha.-(dialkyl)alkyl groups which are functionally substituted, for example by --COOH or --CONH--NH.sub.2, are described. Compositions which contain such anthraquinones, an aminoalcohol and an epoxy resin with or without a hardener are suitable for preparing metallic coatings and images on the cured composition by exposure to light and currentless metal deposition.
    Type: Grant
    Filed: June 20, 1988
    Date of Patent: May 8, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Frederick H. Howell, Rudolf Duthaler, Jurgen Finter, Konrad Oertle, Visvanathan Ramanathan
  • Patent number: 4904815
    Abstract: New phenols are described containing an alkyl substituent containing a functional group; as well as a process for the production of such phenols. The new phenols are useful e.g. as stabilizers in organic or aqueous systems.
    Type: Grant
    Filed: October 13, 1987
    Date of Patent: February 27, 1990
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4835323
    Abstract: New hydroquinones have the formula: ##STR1## wherein p is 1 or 2 and q is 0 or 1, provided that p+q is 1 or 2; R is a residue of formula: ##STR2## wherein Q is (i) -OX or (ii) -PO(OR.sub.11)((O).sub.x R.sub.11); and salts thereof with organic or inorganic acid bases.The groups X and R.sub.11 and x are defined hereinafter.The compounds of formula I are useful as stabilisers in photographic materials.
    Type: Grant
    Filed: September 11, 1986
    Date of Patent: May 30, 1989
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4716248
    Abstract: New compounds having the formula:X--(YQNH.sub.2).sub.p Iwherein p is 1 or 2 and the residues QNH.sub.2 are the same or different and each is a residue of formula: ##STR1## wherein n is an integer from 1 to 15; R.sub.1 is C.sub.1 -C.sub.8 alkyl; R.sub.2 is C.sub.1 -C.sub.4 alkyl; or R.sub.1 and R.sub.2 ; together with the carbon atom to which they are attached, from a C.sub.5 -C.sub.8 cycloalkylene residue; R.sub.3 is H or C.sub.1 -C.sub.6 alkyl, C.sub.3 -C.sub.8 cycloalkyl or C.sub.6 -C.sub.10 aryl; and Y is a divalent residue of formula: ##STR2## wherein R.sub.4 and R.sub.5 are H or C.sub.1 -C.sub.4 alkyl or, when p is 1, the group R.sub.4, together with the group X, can form a tetramethylene chain substituted by the group QNH.sub.2, X is NH.sub.2 or QNH.sub.2 or X may be combined with R.sub.4 as hereinbefore defined; and, when p is 2, X is a direct bond or a --CH.sub.
    Type: Grant
    Filed: October 12, 1984
    Date of Patent: December 29, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Frederick H. Howell, Josef Pfeifer
  • Patent number: 4700003
    Abstract: New compounds having the formula I are described: ##STR1## wherein R and R.sup.1, independently are H, halogen, a straight- or branched-chain alkyl having 1 to 8 carbon atoms or a residue having the formula II: ##STR2## wherein R.sup.2 and R.sup.3 are the same or different and each is H or straight- or branched-chain alkyl having 1 to 4 carbon atoms and R.sup.4 is H, halogen or straight- or branched-chain alkyl having 1 to 4 carbon atoms; provided that at least one of R and R.sup.1 is a residue of formula II, and that when R is a residue of formula II wherein R.sup.2, R.sup.3, and R.sup.4 and H, R.sup.1 may not be ethyl or n-propyl.Processes for producing the new compounds are also disclosed.Compounds of formula I are useful as intermediates for valuable dispersion dyestuffs.
    Type: Grant
    Filed: December 18, 1985
    Date of Patent: October 13, 1987
    Assignee: Ciba-Geigy Corporation
    Inventor: Frederick H. Howell
  • Patent number: 4661601
    Abstract: New compounds having the formula 1 ##STR1## wherein W is hydrogen, halogen, n-alkyl, --NHCOR.sup.1, --COR.sup.1, or phenoxyacetylamino optionally substituted by one or two C.sub.1-12 straight- or branched chain alkyl, X is a substituent in the coupling position and is selected from hydrogen, chlorine, bromine, --SR.sup.11 or a nitrogen-containing heterocyclic residue attached at a ring nitrogen atom, and Y is a group having the formula 2 ##STR2## wherein Q is selected from the residues: --COOR.sup.4 or --CONR.sup.4 R.sup.5, --OM, --NR.sup.7 R.sup.8, --PO(OR.sup.9)[O].sub.x R.sup.10 with X=0 or 1, --SO.sub.2 OH, --SO.sub.2 NR.sup.4 R.sup.5 or CN. The groups R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, M, k and n are defined hereinafter.These compounds are used as black color couplers in photographic materials.
    Type: Grant
    Filed: April 3, 1985
    Date of Patent: April 28, 1987
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4647699
    Abstract: New aminoalkyl anilines having the formula: ##STR1## wherein k is 0 or 1; QNH.sub.2 is a residue of formula ##STR2## which is situated in one of the positions of the benzene ring ortho or para to the amino group and wherein n is an integer from 1 to 15, R.sub.1 is C.sub.1 -C.sub.8 alkyl, R.sub.2 is C.sub.1 -C.sub.4 alkyl or R.sub.1 and R.sub.2, together with the carbon atom to which they are attached, form a C.sub.5 -C.sub.8 cycloalkylene residue, R.sub.3 is H or C.sub.1 -C.sub.6 alkyl, C.sub.3 -C.sub.8 cycloalkyl, or C.sub.6 -C.sub.10 aryl; and R.sub.4 and R.sub.5 are H or C.sub.1 -C.sub.4 alkyl; as well as the corresponding salts of compounds of formula I with organic or inorganic acids and metal salt complexes; process for their production; and their use as intermediates for polyamides.
    Type: Grant
    Filed: April 3, 1985
    Date of Patent: March 3, 1987
    Assignee: Ciba-Geigy Corporation
    Inventor: Frederick H. Howell
  • Patent number: 4631252
    Abstract: New hydroquinone ether compounds of formula I are described: ##STR1## wherein p is 1 or 2 and q is 0 or 1, provided that p+q is 1 or 2, R is a residue of formula II ##STR2## and R.sub.o, R.sub.oo, R.sub.1, R.sub.2, R.sub.3, Q, n and k are as defined in the specification.The new compounds are useful e.g. as stabilizers in photographic material.
    Type: Grant
    Filed: June 6, 1985
    Date of Patent: December 23, 1986
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4616082
    Abstract: New hydroquinone ether compounds of formula I are described: ##STR1## wherein p is 1 or 2 and Q is 0 or 1, provided that p+q is 1 or 2, R is a residue of formula II ##STR2## and R.sub.o, R.sub.oo, R.sub.1, R.sub.2, R.sub.3, Q, n and k are as defined in the specification,The new compounds are useful e.g. as stabilizers in photographic material.
    Type: Grant
    Filed: June 7, 1985
    Date of Patent: October 7, 1986
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4608435
    Abstract: New benzo-1,4-quinones and salts thereof with organic or inorganic acid and bases have the formula I ##STR1## wherein p is 1 or 2 and q is 0 or 1, provided that p+q is 1 or 2, R is a residue of formula II ##STR2## wherein Q is selected from the residues --CO.sub.2 R.sub.4, --CON(R.sub.4)(R.sub.5), --OR.sub.5, --OCOR.sub.7, --N(R.sub.8)(R.sub.9), --PO(OR.sub.10)([O].sub.x R.sub.11), --SO.sub.2 R.sub.12, --CN, Halogen, --NO.sub.2 or --COR.sub.13, n is an integer from 1 to 20, k is 1 or 2 and x is 0 or 1, and R.sub.1 to R.sub.5 and R.sub.7 to R.sub.13 are as defined in the specification.The compounds of formula I are useful in photographic materials such as bleaching inhibitors in films of photographic silver dye bleach materials.
    Type: Grant
    Filed: April 28, 1983
    Date of Patent: August 26, 1986
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4554379
    Abstract: New compounds having the formula:R.sub.4 (QNH.sub.2).sub.x Iwherein x is 1 or 2 and the residues QNH.sub.2 are the same or different and each is a residue of formula: ##STR1## wherein n is an integer from 1 to 15, R.sub.1 is C.sub.1 -C.sub.8 alkyl, R.sub.2 is C.sub.1 -C.sub.4 alkyl or R.sub.1 and R.sub.2, together with the carbon atom to which they are attached, form a C.sub.5 -C.sub.8 cycloalkylene residue, R.sub.3 is H or C.sub.1 -C.sub.6 alkyl, C.sub.3 -C.sub.8 cycloalkyl or C.sub.6 -C.sub.10 aryl and R.sub.4 is a mono- or polyvalent C.sub.6 -C.sub.20 aromatic or C.sub.4 -C.sub.20 .pi.-excessive heterocyclic residue; these compounds are useful as intermediates for polyamides, plastics and for compounds having biological activity.
    Type: Grant
    Filed: April 18, 1985
    Date of Patent: November 19, 1985
    Assignee: Ciba Geigy Corporation
    Inventor: Frederick H. Howell
  • Patent number: 4549015
    Abstract: New hydroquinone ether compounds of formula I are described: ##STR1## wherein p is 1 or 2 and q is 0 or 1, provided that p+q is 1 or 2, R is a residue of formula II ##STR2## and R.sub.o, R.sub.oo, R.sub.1, R.sub.2, R.sub.3, Q, n and k are as defined in the specification.The new compounds are useful e.g. as stabilizers in photographic material.
    Type: Grant
    Filed: June 14, 1983
    Date of Patent: October 22, 1985
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4484000
    Abstract: New hydroquinones having the formula: ##STR1## wherein p is 1 or 2 and q is 0 or 1, provided that p+q is 1 or 2; R is a residue of formula: ##STR2## wherein Q is selected from the residues --COZR.sub.4 wherein Z is 0 or NR.sub.5, --OX wherein X is R.sub.5 or --COR.sub.7, --NR.sub.8 R.sub.9, --PO(OR.sub.10)[O].sub.x R.sub.11 wherein x is 0 or 1, --SO.sub.2 R.sub.12 or --CN, and salts thereof with organic or inorganic acid bases.The groups, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.11, R.sub.12, k and n are defined hereafter.These compounds are used as stabilizers in photographic materials.
    Type: Grant
    Filed: June 18, 1982
    Date of Patent: November 20, 1984
    Assignee: Ciba-Geigy AG
    Inventor: Frederick H. Howell
  • Patent number: 4436936
    Abstract: Compounds having the formula I ##STR1## as well as salts or metal salt complexes thereof, in which formula I n, R.sub.1, R.sub.2 and Z have the meanings given in claim 1, can be prepared under mild reaction conditions by reacting 1.0 mole of an aromatic amine having the formula II ##STR2## with up to three moles of an alkylating agent (III) capable of introducing a residue Z into the benzene ring of an amine (II) at a position ortho or para to the NH.sub.2 group, the reaction being effected at elevated temperature in the presence of an acid catalyst in an aqueous acid medium, containing at least 30% by weight of water, based on the acid, and optionally converting compounds (I) into salts or metal salt complexes. The compounds (I) so produced are useful in the production of intermediates for dyestuffs, additives for plastics, rubbers, oils, etc., and in the production of biologically active compounds.
    Type: Grant
    Filed: June 10, 1982
    Date of Patent: March 13, 1984
    Assignee: Ciba-Geigy Corporation
    Inventor: Frederick H. Howell