Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and multiple x-ray detectors positioned within the vacuum chamber, at different takeoff angles with respect to the sample's x-ray emission position in the chamber. Takeoff angles are provided to improve the counting efficiency of the various sensors. Multiple detectors of different types may be supported within the vacuum chamber on a mechanical support system, which may be adjustable. A method includes operating the sensors to optimize the time required for accurate x-ray counting by gathering data at the multiple takeoff angles.

Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and multiple x-ray detectors positioned within the vacuum chamber, at different takeoff angles with respect to the sample's x-ray emission position in the chamber. Takeoff angles are provided to improve the counting efficiency of the various sensors. Multiple detectors of different types may be supported within the vacuum chamber on a mechanical support system, which may be adjustable. A method includes operating the sensors to optimize the time required for accurate x-ray counting by gathering data at the multiple takeoff angles.

Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and an x-ray detector positioned within the vacuum chamber. The x-ray detector includes an x-ray sensitive solid-state sensor and a mechanical support system for supporting and positioning the detector, including the sensor, within the vacuum chamber. The entirety of the mechanical support system is contained within the vacuum chamber. Multiple detectors of different types may be supported within the vacuum chamber on the mechanical support system. The mechanical support system may also include at least one thermoelectric cooler element for thermo-electrically cooling the x-ray sensors.

Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and an x-ray detector positioned within the vacuum chamber. The x-ray detector includes an x-ray sensitive solid-state sensor and a mechanical support system for supporting and positioning the detector, including the sensor, within the vacuum chamber. The entirety of the mechanical support system is contained within the vacuum chamber. Multiple detectors of different types may be supported within the vacuum chamber on the mechanical support system. The mechanical support system may also include at least one thermoelectric cooler element for thermo-electrically cooling the x-ray sensors.

Abstract: An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding the specimen, and an x-ray detector positioned within the vacuum chamber. The x-ray detector includes an x-ray sensitive solid-state sensor and a mechanical support system for supporting and positioning the detector, including the sensor, within the vacuum chamber. The entirety of the mechanical support system is contained within the vacuum chamber. Multiple detectors of different types may be supported within the vacuum chamber on the mechanical support system. The mechanical support system may also include at least one thermoelectric cooler element for thermo-electrically cooling the x-ray sensors.

Abstract: A system is presented for evaluating the performance of a particle detecting and measuring instrument wherein the instrument receives a specimen and detects the number of particles on the specimen and measures the descriptive parameters of the particles. The system includes a known specimen received by the instrument and wherein the known specimen has known particles on the specimen, with known parameters of each known particle on the specimen. The instrument detects the known particles and measures the parameters thereof. A matching of individual measured particles is made against individual known particles by means of selected known parameters thereof. A comparison is made of the parameters of each measured particle against the parameters of each known particle to which the measured particle was matched and an indication is provided of the instrument's performance as a function of the matching and the comparison.

Abstract: An improved scanning electron microscope is disclosed which includes a compact, replaceable electron beam emitter assembly and concentric liner tubes. The concentric liner tubes extend through a central portion of electromagnetic lenses for forming an evacuated path for the electron beam. An outer sealing jacket is provided for forming a vacuum seal with the column assembly sufficient to maintain a vacuum within the outer sealing jacket. A conductive inner liner tube positioned within the outer sealing jacket is adapted to have the electron beam pass therethrough. The inner liner tube provides supports for spray baffles and/or beam shaping orifices. The improved electron beam emitter assembly within the gun assembly includes a filament clamped between a front plate and a back plate by clamping screws. The clamping screws additionally hold an adjustable grid against the front plate.

Abstract: A scanning electron microscope with an effective vacuum evacuation system and vacuum pump mounting system is disclosed. A manifold having a sufficiently large gas conductance is connected to a gun assembly and to a specimen chamber. A vacuum pump is connected to the manifold for evacuating the gun assembly, specimen chamber and a beam tube. The vacuum pump mounting includes a cylindrical sleeve extending between the vacuum pump and the scanning electron microscope housing with a pair of radial O-rings sealing between the cylindrical sleeve, housing and vacuum pump.

Abstract: X-ray spectral data are normalized to beam current by basing data accumulations upon a fixed beam current integral rather than a fixed acquisition time. A current proportional to beam current is obtained from an aperture in an electron column instrument to provide a continuous monitor of beam current during data accumulation. The current is applied to a digital current integrator producing output pulses at a frequency proportional to the current. Connected to the digital current integrator is a one-shot producing a pulse of fixed width for each integrator pulse. The interval between one-shot pulses is defined as "delay time," and a signal representative of that time interval is produced and utilized to control the actual analysis time such that a prescribed beam current integral is obtained.

Abstract: An instrument system is controlled to acquire an optical image of an object, with the optical image defining a first coordinate system. The object is positioned in a second coordinate system and a point in the optical image is selected. The object is repositioned so that a point on the object corresponding to the selected point in the optical image is positioned at a predetermined point in the second coordinate system. Alternatively, movement of the object causes an indicia on the optical image to move to a point thereon corresponding to the point on the object that is positioned at the predetermined point in the second coordinate system.