Patents by Inventor Frederick Hause

Frederick Hause has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method And Apparatus For Detecting The Endpoint Of A Chemical-Mechanical Polishing Operation
    Publication number: 20070105247
    Abstract: A structure in a semiconductor device useful in determining an endpoint in a chemical-mechanical polishing process is provided. The structure comprises a dielectric layer, an anti-reflective coating, and a metal layer. The dielectric layer has an opening extending therein. The anti-reflective coating extends over at least a portion of the first dielectric layer. The metal layer extends over at least a portion of the anti-reflective coating and within the opening. Thus, during the CMP process, the metal layer is removed, exposing the anti-reflective coating but leaving the metal layer in the opening to form a metal interconnect.
    Type: Application
    Filed: December 7, 2006
    Publication date: May 10, 2007
    Inventors: Frank Mauersberger, Peter Beckage, Paul Besser, Frederick Hause, Errol Ryan, William Brennan, John Jacoponi