Abstract: An apparatus for driving a scanning gate of a photographic film scanning apparatus utilizes a reversible m s , stepping motor, and a system driven by the motor for moving the gate in a pendulum-like manner. The means comprises a shaft, a gear sector fixedly connected on the shaft and a crank arm fixedly connected on the shaft so as to operatively engage the scanning gate, and a worm configured to be driven by the motor. A biasing device is arranged between the gear sector and a chassis of the scanning apparatus to maintain a positive engagement between the worm and the gear sector. Additional biasing devices are connected between the crank arm and the gate to provide for adjustment of the gate about two axes.

Abstract: A protection device for a lens used in a scanning apparatus for imaging data on photographic film, comprises a plate and having a finger gripping portion, a member slidably retained in the plate, a glass piece removably carried by the member, and a biasing member operatively associated with the member for selectively permitting secure holding of the glass piece on the member and easy removal of the glass piece from the member. The plate is provided with a biasing device for securely retaining the member in a desired location such that the glass piece is in a predetermined lens protecting position. A switch is associated with the plate such that the switch is moved to an open position upon movement of the member away from the plate. The biasing member is a pivotally mounted spring configured to hold the glass piece in a desired location on the member and has V-shaped portions to engage portions of the member for positive locking of the spring in the member.

Abstract: A method and apparatus for cleaning and drying semiconductor wafers wherein the wafers may be stored in a wet environment until the cleaning step and wherein, after drying, the wafers are substantially isolated from the remainder of the apparatus and the workplace environment to prevent or at least substantially eliminate the recontamination of the wafer surface. The wafers are removed one at a time from an incoming storage bath and are transported to a cleaning station where they are cleaned and are then transported to a drying station. After being dried the wafers are transported to an output station where they are loaded into a portable enclosure member which substantially isolates the wafers in the enclosure from further contamination. Further, means is provided for introducing clean air into the drying station and venting at least a portion of the air through the cleaning station while at the same time substantially precluding the escape of air into the output station enclosure member.