Patents by Inventor Frederick M. Pressman

Frederick M. Pressman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive reactive ion etch barrier
    Patent number: 5262273
    Abstract: Reaction products of organosilane compounds and a novolac resin having phenolic groups have been found to have a very low rate of etching, thereby enabling the material to also be used as an RIE barrier in semiconductor manufacturing processes.
    Type: Grant
    Filed: February 25, 1992
    Date of Patent: November 16, 1993
    Assignee: International Business Machines Corporation
    Inventors: Peter A. Agostino, Frederick M. Pressman
  • Thermographic reversible photoresist
    Patent number: 5215861
    Abstract: Reaction products of organosilane compounds and a novolac resin having phenolic groups are capable of generating either positive or negative tone patterns depending on the time and temperature of processing.
    Type: Grant
    Filed: March 17, 1992
    Date of Patent: June 1, 1993
    Assignee: International Business Machines Corporation
    Inventors: Peter A. Agostino, Adolph Herbst, Frederick M. Pressman