Abstract: An apparatus and method for drying one or more workpieces. The apparatus and method include the use of a chemically reactive additive to remove contaminants from the wafer surface during processing. In particular, during processing, a wafer is rinsed in a liquid bath and subsequently exposed to a chemically reactive additive. The chemically reactive additive creates a surface tension gradient that physically and chemically alters the properties of the film of the rinse liquid so that the liquid and any contaminants contained therein are removed from the wafer surface.

Abstract: An indicating device in a camera indicates unambiguously whether or not the camera is loaded with film, and how much of the film has been exposed. The device is first indexed from an empty-camera position to a loaded-camera position in response to insertion of film into the camera. It is then indexed sequentially to succeeding positions, each representing the next film image area to be exposed, in response to actuation of a film transport member. The device is thus indexed ultimately to a final position signifying that no film image area remains to be exposed. It is then returned to its empty-camera position in response to removal of the film from the camera. At each of its positions the device presents an identifying indicium to a viewing site to indicate visually the corresponding camera condition. The device is especially useful in a processing camera where it indicates positively whether no film is in the camera or whether a full supply of film covered by a dark slide is in the camera.