Patents by Inventor Frederick William Kern, Jr.
Frederick William Kern, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6634371Abstract: An apparatus for drying one or more workpieces. The apparatus includes the use of a chemically reactive additive to remove contaminants from the wafer surface during processing. In particular, during processing, a wafer is rinsed in a liquid bath and subsequently exposed to a chemically reactive additive. The chemically reactive additive creates a surface tension gradient that physically and chemically alters the properties of the film of the rinse liquid so that the liquid and any contaminants contained therein are removed from the water surface.Type: GrantFiled: May 14, 2001Date of Patent: October 21, 2003Assignee: International Business Machines CorporationInventors: Richard Hilliard Gaylord, III, Frederick William Kern, Jr., Donald Joseph Martin, Harald Franz Okorn-Schmidt, John Joseph Snyder, William Alfred Syverson
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Patent number: 6565666Abstract: Disclosed is a method of removing liquid from a surface of a semiconductor wafer that comprises the steps of providing a plurality of capillary channels, each said capillary channel having a first opening and a second opening, and then placing said first openings in contact with the liquid in a manner effective in drawing away the liquid by capillary action.Type: GrantFiled: November 27, 2000Date of Patent: May 20, 2003Assignee: International Business Machines CorporationInventors: Russell H. Arndt, Glenn Walton Gale, Frederick William Kern, Jr., Kenneth T. Settlemyer, Jr., William A. Syverson
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Patent number: 6355111Abstract: A method for drying one or more workpieces. The method includes the use of a chemically reactive additive to remove contaminants from the wafer surface during processing. In particular, during processing, a wafer is rinsed in a liquid bath and subsequently exposed to a chemically reactive additive. The chemically reactive additive creates a surface tension gradient that physically and chemically alters the properties of the film of the rise liquid so that the liquid and any contaminants contained therein are removed from the wafer surface.Type: GrantFiled: November 24, 1999Date of Patent: March 12, 2002Assignee: International Business Machines CorporationInventors: Richard Hilliard Gaylord, III, Frederick William Kern, Jr., Donald Joseph Martin, Harald Franz Okorn-Schmidt, John Joseph Snyder, William Alfred Syverson
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Patent number: 6354309Abstract: Semiconductor substrates are contacted with a deionized water solution containing an acidic material.Type: GrantFiled: September 29, 2000Date of Patent: March 12, 2002Assignee: International Business Machines CorporationInventors: Russell H. Arndt, Glenn Walton Gale, Frederick William Kern, Jr., Karen P. Madden, Harald F. Okorn-Schmidt, George Francis Ouimet, Jr., Dario Salgado, Ryan Wayne Wuthrich
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Patent number: 6210510Abstract: The present invention is a method and apparatus for mechanically bonding a polymer to a convex surface of a substrate to provide intimate contact therebetween for improved energy transport between a transducer on one side of the substrate and a chemical bath on the other. The polymer seals the surface of the substrate from the chemical bath and may have a low adhesion to the substrate. A thin film of the polymer is brought under a tensile stress to provide intimate physical contact with most of the area of the convex surface. In one embodiment, the tensile stress is achieved by providing polymer as a liquid on the convex surface and then cooling to take advantage of differential thermal contraction between the polymer and the substrate to achieve the tensile stress in the polymer.Type: GrantFiled: November 12, 1999Date of Patent: April 3, 2001Assignee: International Business Machines CorporationInventors: Frederick William Kern, Jr., Donald Joseph Martin
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Patent number: 6173720Abstract: Semiconductor substrates are contacted with a deionized water solution containing an acidic material.Type: GrantFiled: December 2, 1998Date of Patent: January 16, 2001Assignee: International Business Machines CorporationInventors: Russell H. Arndt, Glenn Walton Gale, Frederick William Kern, Jr., Karen P. Madden, Harald F. Okorn-Schmidt, George Francis Ouimet, Jr., Dario Salgado, Ryan Wayne Wuthrich
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Patent number: 6020033Abstract: A method for reducing the corrosive chemical vapor permeability of a polyfluoroorgano resin substrate which comprises coating its outer surface with a vinylidene dichloride copolymer. The method produces a polyfluoroorgano resin substrate-vinylidene dichloride copolymer composite, for example a TEFLON-perfluoralkyl vinylether copolymer pipe having its surface immediate to the environment treated with a vinylidene dichloride/vinyl chloride copolymer.Type: GrantFiled: January 29, 1997Date of Patent: February 1, 2000Assignee: International Business Machines CorporationInventor: Frederick William Kern, Jr.
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Patent number: 5996601Abstract: The present invention is a method and apparatus for mechanically bonding a polymer to a convex surface of a substrate to provide intimate contact therebetween for improved energy transport between a transducer on one side of the substrate and a chemical bath on the other. The polymer seals the surface of the substrate from the chemical bath and may have a low adhesion to the substrate. A thin film of the polymer is brought under a tensile stress to provide intimate physical contact with most of the area of the convex surface. In one embodiment, the tensile stress is achieved by providing polymer as a liquid on the convex surface and then cooling to take advantage of differential thermal contraction between the polymer and the substrate to achieve the tensile stress in the polymer.Type: GrantFiled: June 4, 1998Date of Patent: December 7, 1999Assignee: International Business Machines CorporationInventors: Frederick William Kern, Jr., Donald Joseph Martin
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Patent number: 5899238Abstract: A method for reducing the chemical vapor permeability of a polyfluoroorgano resin substrate by coating its surface with a vinylidene dichloride copolymer is disclosed. The method produces a polyfluoroorgano resin substrate-vinylidene dichloride copolymer composite, for example a Teflon PFA pipe having its surface immediate to the environment treated with a vinylidene dichloride/vinyl chloride copolymer.Type: GrantFiled: August 8, 1995Date of Patent: May 4, 1999Assignee: International Business Machines CorporationInventor: Frederick William Kern, Jr.
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Patent number: 5868882Abstract: The present invention is a method and apparatus for mechanically bonding a polymer to a convex surface of a substrate to provide intimate contact therebetween for improved energy transport between a transducer on one side of the substrate and a chemical bath on the other. The polymer seals the surface of the substrate from the chemical bath and may have a low adhesion to the substrate. A thin film of the polymer is brought under a tensile stress to provide intimate physical contact with most of the area of the convex surface. In one embodiment, the tensile stress is achieved by providing polymer as a liquid on the convex surface and then cooling to take advantage of differential thermal contraction between the polymer and the substrate to achieve the tensile stress in the polymer.Type: GrantFiled: June 28, 1996Date of Patent: February 9, 1999Assignee: International Business Machines CorporationInventors: Frederick William Kern, Jr., Donald Joseph Martin