Patents by Inventor Frederik DEFOUR

Frederik DEFOUR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250076766
    Abstract: An apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
    Type: Application
    Filed: November 15, 2024
    Publication date: March 6, 2025
    Applicant: XSYS PREPRESS NV
    Inventors: Dirk Ludo Julien DE RAUW, Pieter LENSSENS, Frederik DEFOUR
  • Publication number: 20250028252
    Abstract: A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.
    Type: Application
    Filed: October 7, 2024
    Publication date: January 23, 2025
    Applicant: XSYS PREPRESS NV
    Inventors: Frederik DEFOUR, Dirk Ludo Julien DE RAUW
  • Patent number: 12174543
    Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
    Type: Grant
    Filed: January 18, 2021
    Date of Patent: December 24, 2024
    Assignee: XSYS PREPRESS NV
    Inventors: Dirk Ludo Julien De Rauw, Pieter Lenssens, Frederik Defour
  • Patent number: 12124171
    Abstract: An apparatus for exposure of a relief precursor (P) which comprises a substrate layer and at least one photosensitive layer. The apparatus includes a carrying structure for carrying a relief precursor and an LED array configured to illuminate a photosensitive layer of the relief precursor carried by the carrying structure. The LED array is configured to illuminate simultaneously a predetermined surface area of at least 900 cm2. The LED array includes a plurality of subsets of one or more LEDs, each subset being individually controllable. The apparatus also includes a control unit to control the plurality of subsets individually, and such that an irradiation intensity difference in the predetermined surface area is within a predetermined range.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: October 22, 2024
    Assignee: XSYS PREPRESS N.V.
    Inventors: Pieter Lenssens, Frederik Defour
  • Publication number: 20230059435
    Abstract: Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
    Type: Application
    Filed: January 18, 2021
    Publication date: February 23, 2023
    Applicant: XSYS PREPRESS NV
    Inventors: Dirk Ludo Julien DE RAUW, Pieter LENSSENS, Frederik DEFOUR
  • Publication number: 20220276568
    Abstract: An apparatus for exposure of a relief precursor (P) which comprises a substrate layer and at least one photosensitive layer. The apparatus includes a carrying structure for carrying a relief precursor and an LED array configured to illuminate a photosensitive layer of the relief precursor carried by the carrying structure. The LED array is configured to illuminate simultaneously a predetermined surface area of at least 900 cm2. The LED array includes a plurality of subsets of one or more LEDs, each subset being individually controllable. The apparatus also includes a control unit to control the plurality of subsets individually, and such that an irradiation intensity difference in the predetermined surface area is within a predetermined range.
    Type: Application
    Filed: July 14, 2020
    Publication date: September 1, 2022
    Applicant: XEIKON PREPRESS N.V.
    Inventors: Pieter LENSSENS, Frederik DEFOUR