Patents by Inventor Frederik Johannes Van Den Bogaard

Frederik Johannes Van Den Bogaard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
    Patent number: 8394572
    Abstract: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: March 12, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Marco Koert Stavenga, Patrick Wong, Frederik Johannes Van Den Bogaard, Dirk De Vries, David Bessems, Jacques Roger Alice Mycke
  • METHOD OF PREPARING A SUBSTRATE FOR LITHOGRAPHY, A SUBSTRATE, A DEVICE MANUFACTURING METHOD, A SEALING COATING APPLICATOR AND A SEALING COATING MEASUREMENT APPARATUS
    Publication number: 20120129098
    Abstract: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
    Type: Application
    Filed: January 30, 2012
    Publication date: May 24, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus VAN DER HEIJDEN, Marco Koert STAVENGA, Patrick WONG, Frederik Johannes VAN DEN BOGAARD, Dirk DE VRIES, David BESSEMS, Jacques Roger, Alice MYCKE
  • Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
    Patent number: 8114568
    Abstract: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: February 14, 2012
    Assignee: AMSL Netherlands B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Marco Koert Stavenga, Patrick Wong, Frederik Johannes Van Den Bogaard, Dirk De Vries, David Bessems, Jacques Roger Alice Mycke
  • Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
    Publication number: 20090201485
    Abstract: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
    Type: Application
    Filed: November 6, 2008
    Publication date: August 13, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Marco Koert Stavenga, Patrick Wong, Frederik Johannes Van Den Bogaard, Dirk De Vries, David Bessems, Jacques Roger Alice Mycke
  • Immersion lithography apparatus
    Publication number: 20090115979
    Abstract: A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and store contaminants. The sampler may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface with a liquid or with a surface of the immersion system. The sampler may be removable from the immersion lithographic apparatus for inspection.
    Type: Application
    Filed: October 29, 2008
    Publication date: May 7, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Ronald Harm Gunther Kramer, Frederik Johannes Van Den Bogaard, Peter Gerardus Hubertus Maria Janssen
  • Substrates and methods of using those substrates
    Publication number: 20090014030
    Abstract: A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.
    Type: Application
    Filed: July 9, 2007
    Publication date: January 15, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Igor Petrus Maria Bouchoms, Richard Joseph Bruls, Hans Jansen, Martinus Hendrikus Antonius Leenders, Peter Franciscus Wanten, Marcus Theodoor Wilhelmus Van Der Heijden, Jacques Cor Johan Van Der Donck, Frederik Johannes Van Den Bogaard, Jan Groenewold, Sandra Van Der Graaf, Carmen Julia Zoldesi