Abstract: A method for fabricating a semiconductor device includes: providing a substrate; applying a sinter paste layer to the substrate; placing a semiconductor die on or above the sinter paste layer; performing a sintering process to convert the sinter paste layer to a sintered layer; and applying a protective layer by atomic layer deposition or by plasma-enhanced chemical layer deposition onto the semiconductor die and the sintered layer.

Abstract: A substrate arrangement includes: a first metallization layer, nanowires arranged on a surface of the first metallization layer; and a component arranged on the first metallization layer such that a first subset of the nanowires is arranged between the first metallization layer and the component. The nanowires are evenly distributed over a section of the surface area or over the entire surface area of the first metallization layer. Each nanowire includes first and second ends. The first end of each nanowire is inseparably connected to the surface of the first metallization layer. The second end of each nanowire of the first subset is inseparably connected to a surface of one of the component such that the first subset of nanowires forms a permanent connection between the first metallization layer and the component. There are fewer nanowires in the first subset of nanowires than there are total nanowires.

Abstract: An electronic device comprises a semiconductor die, a layer stack disposed on the semiconductor die and comprising one or more functional layers, wherein the layer stack comprises a protection layer which is an outermost functional layer of the layer stack, and a sacrificial layer disposed on the protection layer, wherein the sacrificial layer comprises a material which decomposes or becomes volatile at a temperature between 100° and 400° C.

Abstract: A semiconductor device and method for fabricating a semiconductor device, comprising a paste layer is disclosed. In one example the method comprises attaching a substrate to a carrier, wherein the substrate comprises a plurality of semiconductor dies. A layer of a paste is applied to the substrate. The layer above cutting regions of the substrate is structured. The substrate is cut along the cutting regions.

Abstract: An electronic device comprises a semiconductor die, a layer stack disposed on the semiconductor die and comprising one or more functional layers, wherein the layer stack comprises a protection layer which is an outermost functional layer of the layer stack, and a sacrificial layer disposed on the protection layer, wherein the sacrificial layer comprises a material which decomposes or becomes volatile at a temperature between 100° and 400° C.

Abstract: A semiconductor device and method for fabricating a semiconductor device, comprising a paste layer is disclosed. In one example the method comprises attaching a substrate to a carrier, wherein the substrate comprises a plurality of semiconductor dies. A layer of a paste is applied to the substrate. The layer above cutting regions of the substrate is structured. The substrate is cut along the cutting regions.

Abstract: A method for producing a material-bonding connection between a semiconductor chip and a metal layer is disclosed. For this purpose, a semiconductor chip, a metal layer, which has a chip mounting portion, and also a bonding medium containing a metal powder are provided. The metal powder is sintered in a sintering process. In this case, throughout a prescribed sintering time, the prescribed requirements are met, that the bonding medium is arranged between the semiconductor chip and the metal layer and extends right through from the semiconductor chip to the metal layer, that the semiconductor chip and the metal layer are pressed against one another in a pressing-pressure range that lies above a minimum pressing pressure, that the bonding medium is kept in a temperature range that lies above a minimum temperature and that a sound signal is introduced into the bonding medium.

Abstract: A method for producing a material-bonding connection between a semiconductor chip and a metal layer is disclosed. For this purpose, a semiconductor chip, a metal layer, which has a chip mounting portion, and also a bonding medium containing a metal powder are provided. The metal powder is sintered in a sintering process. In this case, throughout a prescribed sintering time, the prescribed requirements are met, that the bonding medium is arranged between the semiconductor chip and the metal layer and extends right through from the semiconductor chip to the metal layer, that the semiconductor chip and the metal layer are pressed against one another in a pressing-pressure range that lies above a minimum pressing pressure, that the bonding medium is kept in a temperature range that lies above a minimum temperature and that a sound signal is introduced into the bonding medium.

Abstract: An x-ray radiography tomography device for a flexible riser, particularly a riser end fitting on a riser hangoff block on a petroleum platform, the x-ray radiography device comprising the following features: