Patents by Inventor Fredrick Pennachi

Fredrick Pennachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10318657
    Abstract: A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data. In addition, the processor may automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: June 11, 2019
    Assignee: Siemens Product Lifecycle Management Software Inc.
    Inventors: Aarcus Kang, Marc Attar, Fredrick Pennachi
  • Publication number: 20180096082
    Abstract: A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data. In addition, the processor may automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof.
    Type: Application
    Filed: September 30, 2016
    Publication date: April 5, 2018
    Inventors: Aarcus Kang, Marc Attar, Fredrick Pennachi