Patents by Inventor Fredrick Zumsteg

Fredrick Zumsteg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080003519
    Abstract: A donor element useful in an assemblage for imaging by exposure to light comprises a support layer formed by a stretching process, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The light-to-heat conversion layer is coated on the support prior to completion of the stretching process.
    Type: Application
    Filed: October 20, 2005
    Publication date: January 3, 2008
    Inventors: Thomas Felder, Robert Eveson, Christopher Ferguson, James Joiner, Moira Logan, Richard Pankratz, Fredrick Zumsteg Jr
  • Publication number: 20070207413
    Abstract: The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
    Type: Application
    Filed: May 17, 2005
    Publication date: September 6, 2007
    Inventors: Michael Crawford, Hoang Tran, Frank Schadt, Fredrick Zumsteg, Andrew Feiring, Michael Fryd
  • Publication number: 20050260519
    Abstract: The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf?)OR wherein Rf and Rf? are the same or different fluoroalkyl groups of from one to about ten carbon atoms or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 ?m at a wavelength of 157 nm.
    Type: Application
    Filed: October 12, 2001
    Publication date: November 24, 2005
    Inventors: Larry Berger, Jerald Feldman, Viacheslav Petrov, Frank Schadt III, Andrew Feiring, Fredrick Zumsteg Jr.