Patents by Inventor Friedhelm Stein

Friedhelm Stein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and Device for Treating Silicon Substrates
    Publication number: 20120276749
    Abstract: In a method for processing monocrystalline silicon wafers, which are transported while lying flat along a horizontal transport path, etching solution for texturing the surface is applied from above by means of nozzles or the like. The etching solution is applied from above several times in succession onto the upper side of the silicon substrates, remains there and reacts with the silicon substrate.
    Type: Application
    Filed: December 23, 2010
    Publication date: November 1, 2012
    Applicant: Gebr Schmid GmbH
    Inventors: Dirk Habermann, Martin Schoch, Maher Izaaryene, Friedhelm Stein