Abstract: A process and device is shown for coating the delineating surfaces of a hollow object, preferably a hollow object having at least one sealable opening, by means of plasma coating, via the action of plasma on the delineating surface of the hollow object that is to be coated.

Abstract: A vacuum coating device coats substrates on all sides by rotating the substrates in a material flow. The device is for use in a vacuum chamber with a material source, and includes a holder for holding the substrates opposite the material source and drives correlated with the holder to bring about a rotation and shifting movement of the substrates. The device includes a hollow manipulator arm formed from three legs which extend at an angle with respect to one another. More specifically, the first leg extends at an obtuse angle with respect to the second leg, and the second leg extends at an approximately right-angle with respect to the third leg. The substrates are then held at the end of the third leg by the holder. The manipulator arm, when driven by a motor, can rotate around the longitudinal axis of the first leg, and, moreover, can move back and forth in the direction of this longitudinal axis.

Abstract: In a vacuum coating apparatus for an allover coating of a substrate by rotation of the substrate (3) in a stream of material, comprising a vacuum chamber with a material source (13), a substrate holder (6) with a point of attachment (19) for the holding of the substrate (3) in front of the material source (13) and a drive (10, 11, 21) provided for the substrate holder (6) for generating a rotating and shifting motion of the substrate (3), the substrate holder (6) is composed of three legs manufactured from hollow sections (7, 8, 9), disposed at angles to each other, where the first leg (7) and the second leg (8) form an obtuse angle (.alpha.) and the second and third legs (8 and 9) form an approximately right-angle knee, and the substrate (3) is held at the end of the third leg (9), where the substrate holder (6) is rotatable about the longitudinal axis (1) of the first leg (7) by a motor drive and in addition is shiftable axially to and from along this longitudinal axis (1).

Abstract: Apparatus for coating substrates by a vacuum coating process. The apparatus includes a plurality of closed processing chambers, each provided with an entrance/exit closable opening. The individual processing chambers have an approximately equal configuration in groups and are disposed one above the other. The chambers have planes in each case at the same distance from a level on which the apparatus is set up. The individual chambers have entrance/exit closable openings. A common elevator chamber has a substrate lift by which the substrates can be moved vertically from the plane of one processing chamber to the plane of another processing chamber. The entrance/exit closable openings lead all to the common elevator chamber. At least one of the chambers of a group has an entrance/exit airlock chamber and is provided with an entrance/exit airlock opening which forms a connection to space surrounding the apparatus.

Abstract: A crucible (9) of a nonmetallic material with an elongated cavity (42) to contain the material to be evaporated has on top a vapor emission slot (45) which is defined at its longitudinal edges (43, 44) by two elongated plates (40, 41) of a likewise nonmetallic material. In the cavity (42) two heating rods (46, 47) are disposed in a mirror-symmetrical relationship to a plane of symmetry (S) through the vapor emission slot (45), one under each of the plates (40, 41) defining the vapor emission slot (45). Additional heating means are provided outside of the crucible and inside of a thermal barrier system.

Abstract: A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other.

Abstract: In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.

Abstract: Transporting device for vacuum coating installations with several stations and with roller systems (3, 4) for the guidance and advance of essentially two-dimensional substrate holders (1) in a vertical position along a given transporting path through the stations. To avoid interference with the coating process by falling layer material, the substrate holders (1) are guided exclusively in the area of their lower edge (2) by roller systems (3, 4). In a preferred example of the operation, guide rollers are disposed in pairs in the area of the lower edge (2) of the substrate holders (1), the substrate holder (1) being held between said guide rollers. The guide rollers (5, 6) are rotatable about vertical axes A1, A2.