Patents by Inventor Friedrich Lüllau

Friedrich Lüllau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8547592
    Abstract: The invention relates to a device for exposing light-sensitive materials, with an electronic picture memory (2) for storing a master image, with an exposure unit which comprises a light source (22), an electronically activatable light modulator (21) for representing a part picture (24) of the master image (2), and imaging optics (23) for the projection of the part picture (24) onto the light sensitive material (10), with a drive device consisting of motors (9) and of a motor control (12), for moving the exposure unit (8) parallel to the surface of the light-sensitive material (10), with a scroll means (7) for scrolling a picture strip (25, 26) of the master image through the light modulator (21), and with a control device (1) for synchronizing the drive device (9, 12) with the scroll means (7).
    Type: Grant
    Filed: November 3, 2003
    Date of Patent: October 1, 2013
    Assignee: Xeikon IP BV
    Inventors: Friedrich Luellau, Stefan Eggers
  • Publication number: 20130231720
    Abstract: The invention relates to a method for irradiating or treating areas of the body with electromagnetic radiation from a radiation source, the area of the body including at least one irregularly outlined treatment area, which is determined and irradiated. The invention is characterized in that the area of the body is divided up into a number of sub-areas, which at least partly contain the treatment area, and a proportion of the treatment area contained in each sub-area is irradiated with a radiation dose sequentially or in a scrolled manner or step-by-step or in a targeted manner.
    Type: Application
    Filed: October 11, 2011
    Publication date: September 5, 2013
    Applicant: LUELLAU ENGINEERING GMBH
    Inventor: Friedrich Luellau
  • Publication number: 20120314224
    Abstract: The invention relates to a method for irradiating a surface of a three-dimensional object, wherein a field of micromirrors in the beam path of a radiation source modulates the radiation. In order to be able to image irregularly shaped fields even on curved surfaces with the highest possible edge sharpness and to be able to exactly radiate the spatial distribution of the radiation power even onto three-dimensional surfaces, the topography (shape of the surface) is detected and a pulse duty factor is calculated and set for each micromirror so that the power density incident on a planar element corresponds approximately to a target power density and the target dimensions of the radiation surface.
    Type: Application
    Filed: February 7, 2011
    Publication date: December 13, 2012
    Applicant: LUELLAU ENGINEERING GMBH
    Inventor: Friedrich Luellau
  • Publication number: 20070046771
    Abstract: The invention relates to a device for exposing light-sensitive materials, with an electronic picture memory (2) for storing a master image, with an exposure unit which comprises a light source (22), an electronically activatable light modulator (21) for representing a part picture (24) of the master image (2), and imaging optics (23) for the projection of the part picture (24) onto the light sensitive material (10), with a drive device consisting of motors (9) and of a motor control (12), for moving the exposure unit (8) parallel to the surface of the light-sensitive material (10), with a scroll means (7) for scrolling a picture strip (25, 26) of the master image through the light modulator (21), and with a control device (1) for synchronising the drive device (9, 12) with the scroll means (7).
    Type: Application
    Filed: November 3, 2003
    Publication date: March 1, 2007
    Inventors: Friedrich Luellau, Stefan Eggers
  • Patent number: 6844920
    Abstract: An exposure device for exposing a projection of an electronically stored artwork pattern onto a substrate, in particular a printing plate 1, with image processing electronics (2) that can store the image data, with a light modulator (7) that can be electronically controlled by the image processing electronics (2), in particular an LCD display (7) or a micro-mirror device, with an illuminating device (8, 9) for illuminating the light modulator (7), and with a projection lens (11) for projecting the light modulator (7) onto the substrate (1), is improved according to the invention in that the image processing electronics (2) include a compensation device (4, 5) to compensate for optical defects and/or tolerances in the beam path of the exposure device.
    Type: Grant
    Filed: March 8, 2001
    Date of Patent: January 18, 2005
    Assignee: Basys Print GmbH Systeme fuer die Druckindustrie
    Inventor: Friedrich Luellau
  • Publication number: 20030077089
    Abstract: An exposure device for exposing a projection of an electronically stored artwork pattern onto a substrate, in particular a printing plate 1, with image processing electronics (2) that can store the image data, with a light modulator (7) that can be electronically controlled by the image processing electronics (2), in particular an LCD display (7) or a micro-mirror device, with an illuminating device (8, 9) for illuminating the light modulator (7), and with a projection lens (11) for projecting the light modulator (7) onto the substrate (1), is improved according to the invention in that the image processing electronics (2) include a compensation device (4, 5) to compensate for optical defects and/or tolerances in the beam path of the exposure device.
    Type: Application
    Filed: September 16, 2002
    Publication date: April 24, 2003
    Inventor: Friedrich Luellau
  • Patent number: 6411366
    Abstract: The method for exposing a printing plate copies a stored model onto a printing plate. The exposure device includes at least one exposure head (1). Each exposure head (1) has a light source (3), a picture generating unit (8) and a copying optical element (9). The picture generating unit (8) includes electronically controllable micro mirrors arranged in a grid. The stored model is divided into partial images, which are shown in succession by the picture generating unit (8) and the copying optical element (9). Successive partial exposures of the printing plate are made by the at least one exposure head, which is accurately positioned at respective successive exposure positions by an electric linear drive so that individual copies of the partial images are combined into a total image on the printing plate with a position accuracy of better than 5 microns. Exposure times are shortened while maintaining copy quality.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: June 25, 2002
    Inventors: Friedrich Luellau, Claus Mayer
  • Publication number: 20020012110
    Abstract: The invention relates to a method for triggering an exposure device for the photomechanical production of structured surfaces as a copy of an electronically memorized model, in particular for exposing printing plates, in which the exposure device includes at least one light source (3), one picture generating unit (8) comprising movable, electronically individually triggerable micro mirrors arranged in a grid, and one copying optical element (9).
    Type: Application
    Filed: May 19, 1999
    Publication date: January 31, 2002
    Inventors: FRIEDRICH LUELLAU, CLAUS MAYER
  • Patent number: 6211948
    Abstract: The invention relates to a process for the photomechanical production of structured surfaces on a pattern support as an image for an electronically stored original, in particular for exposing offset print plates. The invention further relates to a device for carrying out the process. The original is broken down electronically into partial images which are displayed successively on a liquid crystal screen and reproduced on the pattern support such that the images recombine to form a total image of the original on the design support. The information in a partial image is checked and the partial image is reproduced on the pattern support according to this check.
    Type: Grant
    Filed: August 21, 1996
    Date of Patent: April 3, 2001
    Inventors: Friedrich Lüllau, Claus Mayer, Rolf Lüllau
  • Patent number: 6074065
    Abstract: A polarizer envisaged for the polarization by reflection, in particular for the polarization of ultraviolet light with large apertures comprises light-permeable, preferably plane-parallel plates which in each case are arranged at an angle to the light incident preferably parallel to the optical axis. For improving the transmission of the p-polarization and for reducing the transmission of s-polarization it is provided that that several, preferably plane-parallel plates are arranged inclined with respect to the optical axis in the same direction and in a stack, wherein the angle of incident light to the respective perpendicular of the plates lies in the region of the Brewster angle.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: June 13, 2000
    Assignee: Friedrich Luellau
    Inventors: Claus Mayer, Friedrich Luellau
  • Patent number: 5124559
    Abstract: An aftertreatment apparatus, for printing plates which have been exposed imagewise comprises an exposure station and a heat station which are disposed one behind the other in the direction of conveyance of the printing plates along a conveyor track through the aftertreatment apparatus. The exposure station contains a regulable radiation source for the total area exposure of the printing plates. The housing of the exposure station has an exposure aperture 13 which faces downwardly and which is covered by a filter disc. The housing of the heat station is thermally insulated at three sides and is open downwards in the direction of a reflector table across which the printing plates are fed.
    Type: Grant
    Filed: April 1, 1991
    Date of Patent: June 23, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Rudolf Zertani, Friedrich Luellau, Rolf Leullau