Abstract: A position-sensitive radiation detector includes a substrate and an electrically conductive electrode system which is arranged on a surface of said substrate and the configuration and arrangement of which permits position determination of a charge carrier beam impinging thereon. The substrate and the electrode system each consist of a transparent material, for example glass, or a mixture of indium oxide and tin oxide. Disposed on the electrode system is a layer of luminescent material. The present radiation detector permits at the same both an electronic and an optical signal acquisition, the latter for example photographically, visually or by means of an optoelectronic device, such as a video camera, which picks up the light passing through the substrate. Due to the combined electronic and optical signal acquisition the radiation detector can be used in a very large intensity range.

Abstract: A method of producing X-ray resist with etching patterns, using known supports which are coated with a film comprised of copolymers of methacrylonitrile and methacrylic acid is disclosed. This method uses the following protocol.(a) A copolymer of methacrylonitrile and methacrylic acid with molecular weight <700,000 is used for coating the support.(b) Before X-ray irradiation, the film is thermally treated at temperatures below 150.degree. C. until a solvent-free, uncrosslinked film is obtained.(c) After the X-ray irradiation, the film is tempered for 15-30 min at temperatures in the range 140.degree.-170.degree. C.(d) And subsequently the film is developed with a solvent system L comprised of water and/or an organic solvent which contains oxygen in the form of a hydroxyl group and/or an ether group and/or an ester group.

Abstract: A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two --SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.

Abstract: The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.