Patents by Inventor Frits Meulen

Frits Meulen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060158627
    Abstract: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
    Type: Application
    Filed: January 12, 2006
    Publication date: July 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Nicolaas Kate, Frits Meulen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060087630
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 29, 2005
    Publication date: April 27, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Henrikus Cox, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Nicolaas Kate, Martinus Hendrikus Leenders, Jeroen Mertens, Frits Meulen, Joost Ottens, Franciscus Maria Teunissen, Jan-Gerard Toorn, Martinus Verhagen, Marco Polizzi, Edwin Augustinus Van Gompel, Johannes Smeulers, Stefan Belfroid
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050219481
    Abstract: A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.
    Type: Application
    Filed: April 2, 2004
    Publication date: October 6, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henrikus Herman Cox, Petrus Marinus Christianus Van Den Biggelaar, Frits Meulen, Franciscus Andreas Cornelis Spanjers, Jan-Gerard Van Der Toorn, Arend-Jan Migchelbrink