Patents by Inventor Fritz Bieringer

Fritz Bieringer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5470782
    Abstract: A trench structure is produced in a substrate wafer in a two-step trench process. A trench mask is produced in a first etching step and the trench structure is realized in the substrate wafer in a second etching step. An auxiliary lithography structure is produced in the substrate wafer in the trench process. A protective structure that protects the substrate wafer in the region of the auxiliary lithography structure against an etching attack in the second etching step is formed in the region of the auxiliary lithography structure in the manufacture of the trench mask.
    Type: Grant
    Filed: November 17, 1994
    Date of Patent: November 28, 1995
    Assignee: Siemens Aktiengesellschaft
    Inventors: Udo Schwalke, Fritz Bieringer