Abstract: A memory device includes a first metal structure, a magnetic tunnel junction (MTJ) structure, a second metal structure, a first spacer, and a second spacer. The MTJ structure is over the first metal structure. The second metal structure is over the MTJ structure. The first spacer is over a first sidewall of the second metal structure. The second spacer is over a second sidewall of the second metal structure. The second spacer has a top surface higher than a top surface of the first spacer.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a memory device having a plurality of memory chips that comprise multiple-level-cells. The method includes loading first data in a first chip, programming the first data into selected cells of the first chip using a single-level-cell (SLC) programming mode, and reprogramming the first data stored in the selected cells of the first chip to other cells of the first chip using a multiple-level-cell programming mode. The method also includes repeating the operations of loading, programming, and reprogramming for the remaining chips. The loading operations for the remaining chips begin at the completion of the loading operation for the first chip and occur in a non-overlapping sequential manner, and the loading operations for the remaining chips are performed in parallel with the programming and reprogramming operations of the first chip.

Abstract: Methods and apparatus for a novel memory array are disclosed. In an embodiment, a method is provided for reading a dynamic random-access memory (DRAM) array. The method includes activating the bit line select gates to equalize voltage levels on a plurality of bit lines, deactivating the bit line select gates to maintain the equalized voltage levels on the plurality of bit lines using a bit line capacitance associated with each bit line, and activating a selected word line to access selected memory cells connected to the selected word line. The method also includes activating bit line select gates to pass first data from a first bit line and second data from a second bit line to the sense amplifier. The first data is from a selected memory cell and the second data is reference data. The method also includes determining sensed data from the first and second data.

Abstract: Various 3D cells, array structures, and processes are disclosed. In an embodiment, a memory cell array structure is provided that includes memory cells organized into rows and columns, input lines where each input line is connected to memory cells in a selected row, and the input lines form input line groups, and output lines where each output line is connected to memory cells in a selected column, and the output lines form output line groups. The array structure also includes a multiplexer having multiplexer inputs and multiplexer outputs such that the multiplexer inputs are connected to the output line groups, neuron circuits connected to the multiplexer outputs, and the memory cell array simulates a neural network in which the input lines simulate input layer neurons of the neural network, and the output lines simulate output layer neurons of the neural network.

Abstract: Methods and apparatus for memory operations disclosed. In an embodiment, a method is provided for programming multiple-level-cells. The method includes programming data to single-level-cells (SLC) on SLC word lines using SLC programming operations, applying ramp data to the SLC word lines to determine selected ramp data that matches the data stored in (SLC) cells, and programming multiple-level cells to have a voltage threshold level that is associated with the ramp data. In an embodiment, an apparatus includes a first plane having a plurality of first cell strings coupled to a first page buffer. Each first cell string comprises a plurality of multiple-level cells. The apparatus also includes a second plane having a plurality of second cell strings coupled to a second page buffer. Each second cell string comprises a plurality of single-level cells. The apparatus is also configured so that the first page buffer is connected to communicate with the second page buffer.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a method is provided for programming a NAND flash memory. The method includes precharging selected bit lines of selected memory cells with a bias voltage level while unselected bit lines maintain the inhibit voltage, applying a verify voltage to a selected word line that is coupled to the selected memory cells, and discharging the selected bit lines that are coupled to on-cells over a first time interval. The method also includes sensing a sensed voltage level on a selected bit line, loading the selected bit line with the inhibit voltage level when the sensed voltage level is above a threshold level and a program voltage when the sensed voltage level is equal to or below the threshold level, and repeating the operations of sensing and loading for each of the selected bit lines.

Abstract: Various 3D cells, array structures with parallel bit lines and source lines are disclosed. In an embodiment, a 3D cell structure includes a vertical bit line (BL), a vertical source line (SL), a floating body surrounding the BL and the SL, an insulator surrounding the floating body, a first gate dielectric layer coupled to the insulator, the floating body, top portions of the BL and the SL, a second gate dielectric layer coupled to the insulator, the floating body, and bottom portions of the BL and the SL, a front gate connected to a top surface of the first gate dielectric layer, and a back gate connected to a bottom surface of the second gate dielectric layer.

Abstract: Various 3D memory cells, array architectures, and processes are disclosed. In an embodiment, a cell structure is provided that includes a first material forming a bit line, a second material forming a storage region that is coupled to a first portion of the bit line, and a third material forming a channel that is connected to the storage region and to second and third portions of the bit line. The cell structure also includes a fourth material forming a source line that is connected to the channel, a fifth material forming a front gate coupled to a first portion of the channel and a first portion of the source line, and a sixth material forming a back gate coupled to a second portion of the channel and a second portion of the source line.

Abstract: Various 3D cells, array structures, and processes are disclosed. In an embodiment, a 3D cell structure includes a NOR-type memory cell array having rows of memory cells, and each memory cell stores data that controls a cell current for that memory cell. The structure also includes bit lines connected to the rows of memory cells, and each bit line is connected to one memory cell in each of row. The cell structure also includes source lines connected to the rows of memory cells, respectively, and each source line is connected to all the memory cells of a corresponding row of memory cells. The structure is configured so that input signals applied to the bit lines cause cell currents to flow through the memory cells, and in each row of memory cells, selected cell currents combine to form a row cell current that flows on the associated source line.

Abstract: Various 3D memory cells, array architectures, and processes are disclosed. In an embodiment, a cell structure includes a bit line, source line, front gate, and back gate. The cell structure also includes a floating body having surfaces coupled to the bit line, source line, front gate, and back gate. The floating body has a selected thickness between the front gate and the back gate. When the cell is in a data 0 state and selected voltages are supplied to the bit line, the source line, and the front gate and a negative voltage is supplied to the back gate, channel current between the bit line and the source line flows at a first level. When the cell is in a data 1 state, the channel current between the bit line and the source line flows at a second level to provide an enlarged current sensing window.

Abstract: Various 3D memory cells, array structures, and processes are disclosed. In an embodiment, a 3D memory cell structure includes a vertical conductor core, an insulator surrounding the vertical conductor core, a semiconductor layer surrounding the insulator, charge trapping layers surrounding the semiconductor layer, and a word line layer surrounding at least a portion of the charge trapping layers.

Abstract: Various 3D array structures and processes are disclosed. In an embodiment, a word line staircase structure is provided that includes a plurality of word line layers alternately deposited with a plurality of insulating layers to form a stack and a first word line stairstep that includes all the layers of the stack. The staircase structure also includes one or more additional word line stairsteps such that each successive additional word line stairstep is formed to include less layers of the stack than the preceding word line stairstep to form the word line staircase structure. The stairstep structure also includes multiple contact holes formed in each word line stairstep to contact multiple word line layers within that word line stairstep.

Abstract: Various 3D cells, array structures and processes are disclosed. In an embodiment, a memory cell structure is provided that includes a vertical bit line, an insulator surrounding a first portion of vertical bit line, a continuous semiconductor layer surrounding the insulator and a second portion of the vertical bit line, and an extended portion of conductor material surrounding the continuous semiconductor layer. The memory cell structure also includes a first dielectric layer surrounding extended portion of conductor material, a first conductor layer surrounding the first dielectric layer, a second conductor layer surrounding the first conductor layer, a second dielectric layer on a top surface of the first and second conductor layers, a third dielectric layer on a bottom surface of the first and second conductor layers, a first gate on a top surface of the second dielectric layer, and a second gate on a bottom surface of the third dielectric layer.

Abstract: A quantum bit array is disclosed. In an embodiment, the quantum bit array includes a control gate coupled to a qubit and at least one pass gate coupled between the qubit and an adjacent qubit to control operation of the qubit of the quantum bit array, a bit line, and a first transistor channel that connects the bit line to the control gate. The array further comprises at least one word line coupled to the first transistor channel. The at least one word line selectively controls charge flow through the first transistor channel. The array further comprises a capacitor coupled to selectively store charge in the first transistor channel.

Abstract: Methods and apparatus for memory operations disclosed. In an embodiment, a method is provided for programming multiple-level cells in a memory array. The memory array includes a plurality of planes and each plane includes a plurality of bit lines. The method includes storing multiple data bits in a first group of planes, one data bit per plane. The multiple data bits are stored in bit line capacitances of the first group of planes. The method also includes programming a selected multiple-level cell in a selected plane according to the multiple data bits that are stored in the bit line capacitances of the first group of planes. The selected plane is not one of the first group of planes.

Abstract: Various 3D memory cells, array architectures, and processes are disclosed. In an embodiment, a memory cell structure is provided that includes a vertical bit line, a first semiconductor layer surrounding a first portion of the vertical bit line, and a first gate surrounding the first semiconductor layer. The memory cell structure also includes a second semiconductor layer surrounding a second portion of the vertical bit line, and a gate dielectric layer surrounding a third portion of the vertical bit line. The gate dielectric layer separates the first semiconductor layer and the first gate from the second semiconductor layer.

Abstract: Methods and apparatus for NAND flash memory are disclosed. In an embodiment, a NAND flash memory is provided that includes a plurality of bit lines connected to a plurality of bit line select gates, respectively, and a page buffer connected to the plurality of bit line select gates. The NAND flash memory also includes a plurality of load devices connected to the plurality of bit lines, respectively. The plurality of load devices are configured to provide load current during read operations.

Abstract: Various 3D memory cells, array structures, and processes are disclosed. In an embodiment, a 3D memory cell structure includes a vertical conductor core, an insulator surrounding the vertical conductor core, a semiconductor layer surrounding the insulator, charge trapping layers surrounding the semiconductor layer, and a word line layer surrounding at least a portion of the charge trapping layers.

Abstract: Various 3D cells, array structures and processes are disclosed. In an embodiment, a memory cell structure is provided that includes a vertical bit line, an insulator surrounding a first portion of vertical bit line, a continuous semiconductor layer surrounding the insulator and a second portion of the vertical bit line, and an extended portion of conductor material surrounding the continuous semiconductor layer. The memory cell structure also includes a first dielectric layer surrounding extended portion of conductor material, a first conductor layer surrounding the first dielectric layer, a second conductor layer surrounding the first conductor layer, a second dielectric layer on a top surface of the first and second conductor layers, a third dielectric layer on a bottom surface of the first and second conductor layers, a first gate on a top surface of the second dielectric layer, and a second gate on a bottom surface of the third dielectric layer.

Abstract: Various 3D array structures and processes are disclosed. In an embodiment, a word line staircase structure is provided that includes a plurality of word line layers alternately deposited with a plurality of insulating layers to form a stack and a first word line stairstep that includes all the layers of the stack. The staircase structure also includes one or more additional word line stairsteps such that each successive additional word line stairstep is formed to include less layers of the stack than the preceding word line stairstep to form the word line staircase structure. The stairstep structure also includes multiple contact holes formed in each word line stairstep to contact multiple word line layers within that word line stairstep.