Abstract: A flash memory and an accessing method thereof are provided. The accessing method includes steps of receiving a plurality of contiguous accessing commands, sequentially selecting a plurality of word lines corresponding to the accessing commands, and accessing a plurality of memory cells on each of the word lines according to the accessing commands sequentially. Here, any two of the contiguously selected word lines do not neighbor with each other.

Abstract: Methods for fabricating color filters are provided. Firstly, a substrate having a first region and a second region is provided. Then, a first dichroic layer and a first mask layer are formed on the first region sequentially. Next, a second dichroic layer is formed on the substrate to cover the first mask layer and the surface of the second region of the substrate. Thereafter, a second mask layer is formed on the second dichroic layer on the second region. Afterwards, the second dichroic layer on the first region and between the first mask layer and the second mask layer is etched. Then, the first mask layer and the second mask layer are removed.

Abstract: A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first dichroic filter material layer is removed so as to form a plurality of first dichroic filter units. A second dichroic filter material layer is formed on the substrate and the patterned photoresist layer. The patterned photoresist layer and the second dichroic filter material layer located on the patterned photoresist layer are removed, and the second dichroic filter material layer between the first dichroic filter units are transformed into a plurality of second dichroic filter units. By using etching process and the lift-off process to simultaneously remove redundant dichroic filter material and the photoreisit layer, the multi-chroic filter array device with a relatively small volume can be rapidly produced.

Abstract: A method for fabricating a color filter is disclosed. First, a substrate having a dielectric layer and a passivation thereon is provided. Next, a first pattern transfer process is performed to form a trench in the dielectric layer and the passivation layer, and a color filter is formed in the trench, in which the color filter partially covers the surface of the passivation layer. Next, a chemical mechanical polishing process is performed to planarize the color filter, such that the surface of the color filter is even with the surface of the passivation layer.

Abstract: A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first dichroic filter material layer is removed so as to form a plurality of first dichroic filter units. A second dichroic filter material layer is formed on the substrate and the patterned photoresist layer. The patterned photoresist layer and the second dichroic filter material layer located on the patterned photoresist layer are removed, and the second dichroic filter material layer between the first dichroic filter units are transformed into a plurality of second dichroic filter units. By using etching process and the lift-off process to simultaneously remove redundant dichroic filter material and the photoreisit layer, the multi-chroic filter array device with a relatively small volume can be rapidly produced.

Abstract: A method of manufacturing liquid crystal alignment film includes performing an ion implantation process after providing a layer of organic or inorganic material on a substrate for performing an alignment treatment on the layer of organic or inorganic material is provided. Since the alignment treatment is a kind of non-contact method, it can lower the probability of damaging the organic alignment film and prevent generating powders and particles. Furthermore, the layer of inorganic material is formed on the substrate prior to the alignment treatment, so the inorganic material layer can be patterned before the alignment treatment.

Abstract: A liquid crystal display panel and a fabricating method thereof are provided. The method of fabricating the liquid crystal display panel includes providing an active device array substrate and an opposite substrate. A common voltage input circuit is disposed on the active device array substrate and a common electrode layer is disposed on the opposite substrate. Then, a plurality of conductive posts are formed on the common voltage input circuit or the common electrode layer. Thereafter, a sealant and a liquid crystal layer are disposed between the active device array substrate and the opposite substrate. The sealant encloses the liquid crystal layer. The conductive posts are embedded inside the sealant and electrically connected to the common voltage input circuit and the common electrode layer. Furthermore, a gap is kept between the active device array substrate and the opposite substrate by the conductive posts.