Abstract: A vertical rim trimming machine has a base, a horizontal sliding stand, a vertical sliding stand, a cutter turret, a bottom stand and a fixture. The horizontal sliding stand is mounted on and can horizontally move with respect to the base. The vertical sliding stand is mounted on and can vertically move with respect to the horizontal sliding stand. The cutter turret is mounted on the vertical sliding stand. The bottom stand is mounted on the base. The fixture is mounted on the bottom stand. Thus, the horizontal sliding stand horizontally moves with respect to the base stably and the vertical sliding stand vertically moves with respect to the horizontal sliding stand stably, such that the structure of the vertical rim trimming machine becomes firmer and the stability of trimming is improved.

Abstract: The present invention relates to a bristle-pad hairbrush, comprising a tuft portion and a handle, wherein the handle is a general handle, and the invention is characterized in that the tuft portion includes a plurality of equidistant tuft flat-position areas with oblique planes. Since the tuft flat-position areas are designed with oblique planes, therefore after bristles are planted onto the tuft flat-position areas, the bristles are obliquely covered onto the tuft portion to naturally form a bristle pad disposed on the tuft portion. The shock absorption of the bristle pad keeps the bristle-pad hairbrush in a gentle and smooth contact with a user's hairs and prevents the bristle-pad hairbrush from pulling and tearing the user's hair, and prevents the user's fallen hairs from remaining or accumulating in the tuft portion.

Abstract: A kind of hairbrush that contains bristles spot welded with granular tips at outer end (the end in contact with hair and scalp). The granular tips are made of plastic material admixed with powder mixture of extreme infrared radiation material and poly-element minerals.

Abstract: An improved method of reaction of water PU resins for improving the blocking reactions of beta-dicarbynal compounds and polisocynantes, and reducing the reaction time for water PU blocking, wherein the construction is: ##STR1## wherein: R.sub.1,R.sub.2,R.sub.3,R.sub.4 =hydrogen or alkyl groupn.sub.1 =1.about.100n.sub.2, n.sub.3, n.sub.4 =1.about.10The blocking agents of beta-Dicarbonyl compounds are reduced by D.sub.1 and D.sub.2 which are used in the blocking reactions of water PU.

Abstract: A soluble, solid, or crosslinked graft copolymer of lignin-(2-propenamide)-(2-methyl-3-oxo-4-oxybut-1-ene-(p-ethoxy-(3*p+3)-ol ) having a central lignin network and at least one grafted side chain, R, having randomly repeating units of the formula: ##STR1## such that the central lignin network has a molecular weight of about 1,000 to 150,000; the number of ethoxyl repeat units, p, in the polyol repeat unit is between 1 and 300,000; and the total number of random units in the grafted side chain, n+m, or chains, x*(n+m), is in the range of 1 to 300,000 units, such that the total copolymer molecular weight is in the range of 1,000 to 300,000,000.The copolymers of the present invention are useful as 1) thickeners for water and aqueous solutions or 2) plastics and elastomers.

Abstract: A soluble, solid, or crosslinked graft copolymer of lignin-(2-propenamide)-(2-methyl-3-oxo-4-oxybut-1-ene-(p-ethoxy-(3*p +3)-ol) having a central lignin network and at least one grafted side chain, R, having randomly repeating units of the formula: ##STR1## such that the central lignin network has a molecular weight of about 1,000 to 150,000; the number of ethoxyl repeat units, p, in the polyol repeat unit is between 1 and 300,000; and the total number of random units in the grafted side chain, n+m, or chains, x*(n+m), is in the range of 1 to 300,000 units, such that the total copolymer molecular weight is in the range of 1,000 to 300,000,000.The copolymers of the present invention are useful as 1) thickeners for water and aqueous solutions or 2) plastics and elastomers.

Abstract: An etching process and apparatus employ a novel magnetic enhancement means and a substantially pure molecular bromine plasma in order to perform in a desired manner for a number of important applications requiring etching of single-crystal and polycrystalline silicon.