Abstract: A substrate drying system having an IPA concentration interlock detector for detecting the concentration of substrate-drying IPA vapor in a processing or cleaning tank of a Marongoni-type substrate drying system, for example, as substrates are dried in the cleaning tank after washing typically using deionized water. In the event that inadequate concentrations of the IPA vapor are delivered to the cleaning tank, the IPA concentration interlock detector transmits an alarm signal to the tool controller to alert facility personnel to the inadequate IPA concentrations in the cleaning tank and prevent the formation of water marks on the substrates.

Abstract: Shower tubing which enhances the spray uniformity of deionized water or other rinsing fluid on multiple semiconductor wafers in a wet bench to improve uniformity in the particle-removing capability of the wet bench. Each of a pair of parallel shower tubes in a wet bench cleaning bath is fitted with multiple, closely-adjacent shower nozzles which provide a substantially uniform spray of deionized water or other cleansing or rinsing chemical to all of multiple substrates in the bath.