Patents by Inventor Fu-Yi Chang

Fu-Yi Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for an etch process with silicon concentration control
    Patent number: 9887095
    Abstract: The present disclosure provides one embodiment of an etch system. The etch system includes a tank designed to hold an etch solution for etching; a silicon monitor configured to measure silicon concentration of the etch solution; a drain module coupled to the tank and being operable to drain the etch solution; and a supply module being operable to fill in the tank with a fresh etch solution.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: February 6, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Fu Yi Chang, Yih-Song Chiu, Shao-Yen Ku
  • System and Method for an Etch Process with Silicon Concentration Control
    Publication number: 20140273303
    Abstract: The present disclosure provides one embodiment of an etch system. The etch system includes a tank designed to hold an etch solution for etching; a silicon monitor configured to measure silicon concentration of the etch solution; a drain module coupled to the tank and being operable to drain the etch solution; and a supply module being operable to fill in the tank with a fresh etch solution.
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Fu-Yi Chang, Yih-Song Chiu, Shao-Yen Ku