Abstract: An ambient pressure compensation structure for an ultraviolet difference spectrum gas sensor includes a closed box, an ultraviolet difference spectrum gas sensor, a digital pressure sensor, a thermostatic controller, an industrial control computer, a pressure regulating assembly and a limiting partition; the pressure regulating assembly and the limiting partition are arranged inside the closed box, the pressure regulating assembly comprises a piston, a regulating rod and a driving motor, the left side of the piston is connected with the regulating rod, the front end of the regulating rod penetrates out of the closed box and is connected with the driving motor, and the piston divides the interior of the closed box into a pressure regulating air chamber and a working air chamber. Also disclosed is an ambient pressure compensation method for an ultraviolet difference spectrum gas sensor.

Abstract: Disclosed is a stitching-measurement device adapted for performing stitching-measurement on a surface of a concave spherical lens, including: an interferometer, a reference lens, a first plane mirror, a second plane mirror, a first adjustment mechanism, a second adjustment mechanism, a concave spherical object to be measured, a motion table and a control mechanism, the first plane mirror being mounted on the first adjustment mechanism configured to change a position of the first plane mirror; the second plane mirror being mounted on the second adjustment mechanism configured to change a position of the second plane mirror; the concave spherical object to be measured being placed on the motion table configured to change a position of the concave spherical object to be measured; the control mechanism communicating with the interferometer, the first adjustment mechanism, the second adjustment mechanism, and the motion table for issuing control signals, wherein by the first adjustment mechanism and the second adj

Abstract: A detection device adapted to detect lens surface and a stitching interferometer including the same are disclosed.

Abstract: A detection device adapted to detect lens surface and a stitching interferometer including the same are disclosed.

Abstract: Disclosed is a stitching-measurement device adapted for performing stitching-measurement on a surface of a concave spherical lens, including: an interferometer, a reference lens, a first plane mirror, a second plane mirror, a first adjustment mechanism, a second adjustment mechanism, a concave spherical object to be measured, a motion table and a control mechanism, the first plane mirror being mounted on the first adjustment mechanism configured to change a position of the first plane mirror; the second plane mirror being mounted on the second adjustment mechanism configured to change a position of the second plane mirror; the concave spherical object to be measured being placed on the motion table configured to change a position of the concave spherical object to be measured; the control mechanism communicating with the interferometer, the first adjustment mechanism, the second adjustment mechanism, and the motion table for issuing control signals, wherein by the first adjustment mechanism and the second adj

Abstract: A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.

Abstract: Embodiments of the present disclosure relate to a measuring method and device for measuring surface defects of a cambered optical element, which belongs to the field of photoelectric detection technology. The device includes a sensor measuring head, a rotatable workpiece table, an automatic sampling device, and a spraying device. The sensor measuring head includes an illumination sub-system and a line scan imaging sub-system, the illumination sub-system provides an illumination of high uniformity and high brightness for a surface of a sample to be detected, the rotatable workpiece table and the imaging sub-system are configured for performing a ring belt scanning and a high resolution scatter imaging to the defects on an optical surface region.

Abstract: Embodiments of the present disclosure relate to a measuring method and device for measuring surface defects of a cambered optical element, which belongs to the field of photoelectric detection technology. The device includes a sensor measuring head, a rotatable workpiece table, an automatic sampling device, and a spraying device. The sensor measuring head includes an illumination sub-system and a line scan imaging sub-system, the illumination sub-system provides an illumination of high uniformity and high brightness for a surface of a sample to be detected, the rotatable workpiece table and the imaging sub-system are configured for performing a ring belt scanning and a high resolution scatter imaging to the defects on an optical surface region.

Abstract: A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.

Abstract: The present disclosure provides detection devices and methods using a diffraction wavefront of a pinhole stitching measurement of surface shape. The light emitted from the laser passes through a filter hole, a first condenser lens, a spatial filter, a beam expander, a half wave plate, a ?/4 wave plate, an attention plate and then is transmitted through a beam splitter, reflected by a reflecting mirror and is irradiated onto an pinhole through a first optical adjustable shelf and a second set of condenser lens. A part of diffraction light generated by the pinhole is irradiated to the mirror to be measured; the light reflected by the mirror to be measured is reflected by a frame of the pinhole and generate a diffraction fringe along with another part of the diffraction wavefront of the pinhole. The interference fringe is focused by the third set of condenser lens on the third optical adjustable shelf and is collected by the CCD detector.

Abstract: The present disclosure provides detection devices and methods using a diffraction wavefront of a pinhole stitching measurement of surface shape. The light emitted from the laser passes through a filter hole, a first condenser lens, a spatial filter, a beam expander, a half wave plate, a ?/4 wave plate, an attention plate and then is transmitted through a beam splitter, reflected by a reflecting mirror and is irradiated onto an pinhole through a first optical adjustable shelf and a second set of condenser lens. A part of diffraction light generated by the pinhole is irradiated to the mirror to be measured; the light reflected by the mirror to be measured is reflected by a frame of the pinhole and generate a diffraction fringe along with another part of the diffraction wavefront of the pinhole. The interference fringe is focused by the third set of condenser lens on the third optical adjustable shelf and is collected by the CCD detector.