Patents by Inventor Fujio Kanatani

Fujio Kanatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4563062
    Abstract: A microscope optical system for observation of test object, comprises an objective lens and a compensator provided to be inserted into and retracted from the optical path of the objective lens. The compensator is inserted into the optical path according to the change of the optical path length of the medium between the object lens and object to maintain good image forming performance irrespective of such change of the optical path length.
    Type: Grant
    Filed: August 14, 1984
    Date of Patent: January 7, 1986
    Assignee: Nippon Kogaku K.K.
    Inventor: Fujio Kanatani
  • Patent number: 4558949
    Abstract: Disclosed is a horizontal position detecting device for maintaining the surface of a body to be inspected vertically to the optical axis of a main objective lens. The device includes an illumination optical system and a condenser lens system. The illumination optical system supplies parallel light rays to the surface of the body from the direction oblique to the optical axis of the objective lens. The condenser lens system condenses the light rays supplied by the illumination optical system and reflected by the surface of the body. The optical axes of the illumination optical system and the condenser lens system are arranged substantially symmetrically with respect to the axis of the objective lens.
    Type: Grant
    Filed: September 17, 1982
    Date of Patent: December 17, 1985
    Assignee: Nippon Kogaku KK
    Inventors: Makoto Uehara, Takeshi Sudo, Fujio Kanatani
  • Patent number: 4402596
    Abstract: A projection type exposure device includes a main projection objective lens for projecting onto a wafer a predetermined pattern on a negative plate to be projected, a main illuminating optical system including a condenser lens for illuminating the negative plate to be projected, and an alignment optical system for forming the image of a reference mark provided on the negative plate to be projected and the image of an alignment mark on the wafer through the main projection objective lens from between the condenser lens and the main projection objective lens. The alignment optical system has a first objective lens and a second objective lens for condensing the light beam from the first objective lens, the first and second objective lenses being disposed on the same optical axis, and a reflecting member for bending the optical axis so that it is orthogonal to the negative plate to be projected. The first objective lens and the reflecting member are movable together relative to the negative plate to be projected.
    Type: Grant
    Filed: February 4, 1982
    Date of Patent: September 6, 1983
    Assignee: Nippon Kogaku K.K.
    Inventor: Fujio Kanatani