Patents by Inventor Fukusaburou Ishihara

Fukusaburou Ishihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same
    Patent number: 6265309
    Abstract: A cleaning agent for use in producing semiconductor devices. The cleaning agent is an aqueous solution containing (A) a fluorine-containing compound, (B) a salt of boric acid, (C) a water-soluble organic solvent, and optionally, (D) a specific quaternary ammonium salt or (D′) a specific ammonium salt of an organic carboxylic acid or a specific amine salt of an organic carboxylic acid. The polymeric deposit inside and around the via holes and on the side wall of the conductive line pattern formed during the dry etching process can be effectively removed by using the cleaning agent without affecting the dimensions of the via holes and the conductive line pattern.
    Type: Grant
    Filed: May 10, 1999
    Date of Patent: July 24, 2001
    Assignees: Mitsubishi Gas Chemicals Co., Inc., Texas Instruments Incorporated
    Inventors: Hideto Gotoh, Tsuyoshi Matsui, Takayuki Niuya, Tetsuo Aoyama, Taketo Maruyama, Tetsuya Karita, Kojiro Abe, Fukusaburou Ishihara, Ryuji Sotoaka