Abstract: An information processing device includes a processor configured to acquire a document image illustrating a document, acquire a related character string associated with a target character string included in the document image, and extract target information corresponding to the target character string from a region set with reference to a position of the related character string in the document image.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 ?m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; in the Formula (1), R1 and R2 express a monovalent organic group, and may be identical or different; “A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1, in the Formula (2), R3, R4, and R5 express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5. Preferably, 0.25?a?0.60, and 0?c?0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

Abstract: A hole transporting polymer having a specific Si-containing repeating unit represented by a formula (1) and specific molecular weight, an excellent hole transporting property, and superior durability and film-forming properties, and the organic EL device, using the bole transporting polymer having excellent light emitting characteristics are disclosed.

Abstract: A hole transporting polymer having a specific repeating unit and specific molecular weight, which has excellent hole transporting property, and is superior in durability and film-forming property, and the organic EL device using the hole transporting polymer has excellent light emitting characteristics.

Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 &mgr;m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; 1

Abstract: A hole transporting polymer including a repeating unit represented by one of formulas (1) and (5): It can exhibit an excellent hole transporting property and exhibits superior durability and film-forming properties. An organic EL device using this hole transporting polymer has excellent light emitting characteristics.

Abstract: Provided is a polymeric fluorescent substance which emits a fluorescence in a solid state, which comprises the following repeating unit in an amount of 20 mol % or more based on the total amount of all repeating units, in the formula, X1 represents a group selected from the group consisting of —CR3═CR4—, —C≡C—, —SiR5R6—, —NR7—, —CO—, —CO—O—, —O—CO—, —SO2—, a carbon-carbon single bond, —O— and —S—. The polymeric fluorescent substance has strong fluorescence, and can be suitably used as a polymer LED and a dye for laser.

Abstract: An organic electroluminescence device which has a pair of electrodes, at least one of which is transparent or semitransparent, and at least one organic layer formed between the electrodes. The organic layer contains a hole transporting material and a light emitting material in the same or different layer. The hole transporting material contains at least one polysilane whose main chain skeleton is composed of a repeating unit represented by the general formula (1) and a repeating unit represented by the general formula (2): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group, Ar.sub.1 represents a substituted or unsubstituted arylene group and Ar.sub.2 represents a substituted or unsubstituted aryl group. The polysilane satisfies the expression 0.2.ltoreq.z.ltoreq.

Abstract: A polysilane is disclosed whose main chain skeleton has a repeating unit represented by the general formula (1): ##STR1## wherein R.sub.1 represents a substituted or unsubstituted alkyl cycloalkyl, aryl or aralkyl group; X is a atom having an unpaired electron or a group containing an atom having an unpaired electron and represents an oxygen atom, sulfer atom or a nitrogen atom-containing group represented by the general formula (2): ##STR2## wherein R.sub.2 represents a substituted or unsubstituted alkyl, cycloalkyl, aryl or aralkyl group; Ar.sub.1 represents a substituted or unsubstituted arylene group; and Ar.sub.2 represents a substituted or unsubstituted aryl group, a group having an aromatic amine skeleton or a group ethenylene skeleton; a process for producing the polysilane; and a dihalosilane which is the starting material therefor. The polysilane compound has an excellent moldability as a high polymeric material and a higher hole drift mobility as a hole transporting material.