Abstract: Disclosed is a method for applying a control reference value regarding a quality control sample to a specimen analyzer by a computer, the method comprising: generating the control reference value on the basis of a measurement result of the quality control sample measured by the specimen analyzer; and applying the control reference value to the specimen analyzer.

Abstract: An operation for forming a trench after forming a via hole includes an operation for exposing a region for forming the via hole to light and an operation for exposing a region for forming the interconnect trench. More specifically, even if chemically amplified resist is buried in the via hole after the via hole is formed, then the region for forming of via hole is exposed to light again, so that the inside of the via hole is fully exposed to light. This allows removing the buried resist from the regions in via hole exposed to light, or namely the region and the region, with a developing solution, exposing at least a portion of the inner wall of the via hole to obtain the trench having a desired structure.