Patents by Inventor Fumiaki Kumasaka

Fumiaki Kumasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11626524
    Abstract: A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: April 11, 2023
    Assignee: FUJITSU LIMITED
    Inventors: Hideyuki Amada, Fumiaki Kumasaka, Toshio Manabe, Toshihisa Anazawa, Yoshihiko Imanaka
  • Publication number: 20190296165
    Abstract: A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
    Type: Application
    Filed: June 11, 2019
    Publication date: September 26, 2019
    Applicant: FUJITSU LIMITED
    Inventors: Hideyuki AMADA, Fumiaki KUMASAKA, Toshio MANABE, Toshihisa Anazawa, Yoshihiko Imanaka
  • Patent number: 10328419
    Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing t gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: June 25, 2019
    Assignee: FUJITSU LIMITED
    Inventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio Manabe, Hideyuki Amada, Sachio Ido, Fumiaki Kumasaka, Naoki Awaji
  • Publication number: 20180290130
    Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing t gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.
    Type: Application
    Filed: June 13, 2018
    Publication date: October 11, 2018
    Applicant: FUJITSU LIMITED
    Inventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio MANABE, Hideyuki AMADA, Sachio IDO, Fumiaki KUMASAKA, Naoki AWAJI
  • Patent number: 10016746
    Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: July 10, 2018
    Assignee: FUJITSU LIMITED
    Inventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio Manabe, Hideyuki Amada, Sachio Ido, Fumiaki Kumasaka, Naoki Awaji
  • Publication number: 20170345956
    Abstract: A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
    Type: Application
    Filed: April 28, 2017
    Publication date: November 30, 2017
    Applicant: FUJITSU LIMITED
    Inventors: Hideyuki AMADA, Fumiaki KUMASAKA, Toshio MANABE, Toshihisa Anazawa, Yoshihiko Imanaka
  • Publication number: 20170341062
    Abstract: A photoexcitation material includes: a wurtzite type solid solution crystal containing gallium, zinc, nitrogen and oxygen, wherein a peak (A) of an existence ratio of nitrogen or oxygen which is a first adjacent atom of the gallium or zinc and a peak (B) of an existence ratio of gallium or zinc which is a second adjacent atom of the gallium or zinc satisfy a relational expression of A>B in a relationship between a distance and the existence ratio of the adjacent atom of the gallium or zinc, the relationship being obtained from an extended X-ray absorption fine structure analysis.
    Type: Application
    Filed: April 28, 2017
    Publication date: November 30, 2017
    Applicant: FUJITSU LIMITED
    Inventors: Toshihisa Anazawa, Yoshihiko Imanaka, Toshio MANABE, Hideyuki AMADA, Sachio IDO, Fumiaki KUMASAKA, Naoki AWAJI
  • Patent number: 9082552
    Abstract: A method of manufacturing a capacitor includes forming, above a first metal foil, a first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle, forming, in the first dielectric film, a first via conductor connected to the first metal foil and a second via conductor connected to the first metal foil, forming, above the first dielectric film, a first electrode pattern connected to the first via conductor, and patterning the first metal foil to form a second electrode pattern connected to the second via conductor.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: July 14, 2015
    Assignee: FUJITSU LIMITED
    Inventors: Yoshihiko Imanaka, Hideyuki Amada, Fumiaki Kumasaka
  • Patent number: 8957499
    Abstract: A method of manufacturing a capacitor includes forming a first ceramic film on a first base made of a metal, forming a second ceramic film on a second base made of a metal, forming a first copper electrode pattern and a first copper via-plug on a surface of one of the first and second ceramic films, the electrode pattern and the via-plug being separate from each other, bonding the first and second ceramic films together with the first electrode pattern and the via-plug therebetween, by applying a pulsed voltage between the first base and the second base while the first base and the second base are pressed so that the first ceramic film and the second ceramic film are pressed on each other, and removing the second base.
    Type: Grant
    Filed: September 8, 2011
    Date of Patent: February 17, 2015
    Assignee: Fujitsu Limited
    Inventors: Yoshihiko Imanaka, Hideyuki Amada, Fumiaki Kumasaka
  • Publication number: 20120074521
    Abstract: A method of manufacturing a capacitor includes forming a first ceramic film on a first base made of a metal, forming a second ceramic film on a second base made of a metal, forming a first copper electrode pattern and a first copper via-plug on a surface of one of the first and second ceramic films, the electrode pattern and the via-plug being separate from each other, bonding the first and second ceramic films together with the first electrode pattern and the via-plug therebetween, by applying a pulsed voltage between the first base and the second base while the first base and the second base are pressed so that the first ceramic film and the second ceramic film are pressed on each other, and removing the second base.
    Type: Application
    Filed: September 8, 2011
    Publication date: March 29, 2012
    Applicant: FUJITSU LIMITED
    Inventors: Yoshihiko Imanaka, Hideyuki Amada, Fumiaki Kumasaka
  • Patent number: 5276724
    Abstract: Several ten thousands or several millions of juxtaposed hollow thin tubes, each having a diameter of, for example, 12 .mu.m and a length of 1 mm, are joined to each other to form a window having a predetermined open surface area. The window having a diameter of, for example, 30 mm, can withstand a differential pressure of several atm. A high-vacuum X-ray source and the window consisting of thin tubes having the aforementioned dimensions are connected through a differential evacuating device having a plurality of stages connected with a partitioning wall having an orifice of predetermined dimensions provided between the adjacent stages. The pressures at the two sides of the window are maintained to the atmospheric pressure and a pressure which is 1/10th of the atmospheric pressure, respectively. X-rays having a long wavelength of 10 .ANG.
    Type: Grant
    Filed: September 15, 1992
    Date of Patent: January 4, 1994
    Assignee: Fujitsu Limited
    Inventors: Fumiaki Kumasaka, Yoshimi Yamashita, Kei Horiuchi, Yasuo Nara