Patents by Inventor Fumiaki Nihei
Fumiaki Nihei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10209591Abstract: According to one embodiment, a projection type liquid crystal display device includes a liquid crystal display panel and a bezel. The liquid crystal display panel includes an array substrate, an opposed substrate, and a liquid crystal layer provided between the array substrate and the opposed substrate. The liquid crystal display panel has a first surface on one side of the array substrate and the opposed substrate, and a second surface on another side of the array substrate and the opposed substrate. The bezel covers a part of the liquid crystal panel. The bezel includes a first opening provided on a side of the first surface and a second opening provided on a side of the second surface. The second opening has a larger size than the first opening.Type: GrantFiled: November 11, 2016Date of Patent: February 19, 2019Assignee: Japan Display Inc.Inventor: Fumiaki Nihei
-
Publication number: 20170059956Abstract: According to one embodiment, a projection type liquid crystal display device includes a liquid crystal display panel and a bezel. The liquid crystal display panel includes an array substrate, an opposed substrate, and a liquid crystal layer provided between the array substrate and the opposed substrate. The liquid crystal display panel has a first surface on one side of the array substrate and the opposed substrate, and a second surface on another side of the array substrate and the opposed substrate. The bezel covers a part of the liquid crystal panel. The bezel includes a first opening provided on a side of the first surface and a second opening provided on a side of the second surface. The second opening has a larger size than the first opening.Type: ApplicationFiled: November 11, 2016Publication date: March 2, 2017Applicant: apan Display Inc.Inventor: Fumiaki NIHEI
-
Patent number: 9529218Abstract: According to one embodiment, a projection type liquid crystal display device includes a liquid crystal display panel and a bezel. The liquid crystal display panel includes an array substrate, an opposed substrate, and a liquid crystal layer provided between the array substrate and the opposed substrate. The liquid crystal display panel has a first surface on one side of the array substrate and the opposed substrate, and a second surface on another side of the array substrate and the opposed substrate. The bezel covers a part of the liquid crystal panel. The bezel includes a first opening provided on a side of the first surface and a second opening provided on a side of the second surface. The second opening has a larger size than the first opening.Type: GrantFiled: April 21, 2014Date of Patent: December 27, 2016Assignee: Japan Display Inc.Inventor: Fumiaki Nihei
-
Publication number: 20140320754Abstract: According to one embodiment, a projection type liquid crystal display device includes a liquid crystal display panel and a bezel. The liquid crystal display panel includes an array substrate, an opposed substrate, and a liquid crystal layer provided between the array substrate and the opposed substrate. The liquid crystal display panel has a first surface on one side of the array substrate and the opposed substrate, and a second surface on another side of the array substrate and the opposed substrate. The bezel covers a part of the liquid crystal panel. The bezel includes a first opening provided on a side of the first surface and a second opening provided on a side of the second surface. The second opening has a larger size than the first opening.Type: ApplicationFiled: April 21, 2014Publication date: October 30, 2014Applicant: JAPAN DISPLAY INC.Inventor: Fumiaki NIHEI
-
Patent number: 7265484Abstract: The radius of curvature of an outer surface of a panel useful portion is 10,000 mm or more. Assuming that a length of a perforated region of a shadow mask in an X-axis (major axis) direction is 2L, s is a variable satisfying 0<s<1, a sagging amount difference of the perforated region at a point of X=sL with respect to a point of X=0 on the X axis and a sagging amount difference of the perforated region at a point of X=L with respect to the point of X=sL on the X axis are ?Z01(s) and ?Z02(s), respectively, a sagging amount difference of the perforated region at the point of X=sL with respect to the point of X=0 on the long side and a sagging amount difference of the perforated region at the point of X=L with respect to the point of X=sL on the long side are ?Z11(s) and ?Z12(s), respectively, when ?(s) represented by ?(s)=(?Z01(s)/?Z11(s))/(?Z02(s)/?Z12(s)) is defined, d?(s)/ds?0.4 is satisfied in at least a portion in a range of 0.2?s?0.8.Type: GrantFiled: May 31, 2005Date of Patent: September 4, 2007Assignee: Matsushita Toshiba Picture Display Co., Ltd.Inventors: Fumiaki Nihei, Norio Shimizu, Toshio Uchikawa
-
Patent number: 7045942Abstract: The radius of curvature of the outer surface of a panel is 10,000 mm or more, and a shadow mask is made of a material containing 95% or more of iron. A sagging amount change curve along a curve C1 on the surface of the shadow mask, which a plane passing through a center P0 of a useful area of the shadow mask and parallel to a tube axis and a major axis crosses, satisfies a particular Condition 1. Assuming that an intersection between the curve C1 and a useful area end of the shadow mask is a major axis end PL, a distance from the center P0 to the major axis end PL along a major axis is W, and a point on the curve C1 away from the center P0 by ?×W in the major axis direction is P1, a sagging amount change curve along a curve C2 on the surface of the shadow mask, which a plane passing through the point P1 and parallel to the tube axis and the minor axis crosses, satisfies a particular Condition 2.Type: GrantFiled: June 1, 2005Date of Patent: May 16, 2006Assignee: Matsushita Toshiba Picture Display Co., Ltd.Inventors: Norio Shimizu, Fumiaki Nihei, Toshio Uchikawa
-
Publication number: 20060066207Abstract: The radius of curvature of an outer surface of a useful portion of a panel is 10,000 mm or more, and a shadow mask is made of a material containing 95% or more of iron. Assuming that a distance (unit: mm) along an X-axis between a center of the panel and a peripheral edge of the useful portion is LH, and a total number of rows of apertures composed of electron beam passage apertures arranged on a straight line substantially parallel to a Y-axis is N, 0.9?LH/N?1.0 is satisfied. Furthermore, assuming that a pitch of adjacent rows of apertures is PHC at a center of a perforated region of the shadow mask, PHH at a major axis end of the perforated region, and PHM at a point away from the center of the perforated region by 2/3 of a distance MH between the center of the perforated region and the major axis end along the X-axis, PHM/PHC?1.2 and PHH/PHC?1.4 are satisfied.Type: ApplicationFiled: May 31, 2005Publication date: March 30, 2006Applicant: Matsushita Toshiba Picture Display Co., Ltd.Inventors: Norio Shimizu, Fumiaki Nihei, Takashi Murai
-
Publication number: 20060028115Abstract: The radius of curvature of an outer surface of a panel useful portion is 10,000 mm or more. Assuming that a length of a perforated region of a shadow mask in an X-axis (major axis) direction is 2L, s is a variable satisfying 0<s<1, a sagging amount difference of the useful portion at a point of X=sL with respect to a point of X=0 on the X axis and a sagging amount difference of the perforated region at a point of X=L with respect to the point of X=sL on the X axis are ?Z01(s) and ?Z02(s), respectively, a sagging amount difference of the useful portion at the point of X=sL with respect to the point of X=0 on the long side and a sagging amount difference of the perforated region at the point of X=L with respect to the point of X=sL on the long side are ?Z11(s) and ?Z12(s), respectively, when ?(s) represented by ?(s)=(?Z01(s)/?Z11(s))/(?Z02(s)/?Z12(s)) is defined, d?(s)/ds?0.4 is satisfied in at least a portion in a range of 0.2?s?0.8.Type: ApplicationFiled: May 31, 2005Publication date: February 9, 2006Applicant: Matsushita Toshiba Picture Display Co., Ltd.Inventors: Fumiaki Nihei, Norio Shimizu, Toshio Uchikawa
-
Publication number: 20050269930Abstract: The radius of curvature of the outer surface of a panel is 10,000 mm or more, and a shadow mask is made of a material containing 95% or more of iron. A sagging amount change curve along a curve C1 on the surface of the shadow mask, which a plane passing through a center P0 of a useful area of the shadow mask and parallel to a tube axis and a major axis crosses, satisfies a particular Condition 1. Assuming that an intersection between the curve C1 and a useful area end of the shadow mask is a major axis end PL, a distance from the center P0 to the major axis end PL along a major axis is W, and a point on the curve C1 away from the center P0 by ?×W in the major axis direction is P1, a sagging amount change curve along a curve C2 on the surface of the shadow mask, which a plane passing through the point P1 and parallel to the tube axis and the minor axis crosses, satisfies a particular Condition 2.Type: ApplicationFiled: June 1, 2005Publication date: December 8, 2005Applicant: Matsushita Toshiba Picture Display Co., Ltd.Inventors: Norio Shimizu, Fumiaki Nihei, Toshio Uchikawa
-
Publication number: 20050174032Abstract: A shadow mask has a major axis H and a minor axis V that intersect at right angles with each other, and a curvature along the major axis is set to satisfy the following relationships, Cxm0<Cxmv, and Cxmd<Cxmh where Cxm0 is a curvature at an origin O where the major axis and the minor axis intersect at right angles, Cxmv is a curvature at a point (0, Ymvi) that is located towards a long side from a point of at least ¾ of a distance from the origin on the minor axis to an end of an effective dimension, Cxmh is a curvature at a point (Xmhi, 0) that is located in a region of 2/4 to ¾ of a distance from the origin on the major axis to an end of an effective dimension, and Cxmd is a curvature at a coordinate point (Xmhi, Ymvi).Type: ApplicationFiled: April 15, 2005Publication date: August 11, 2005Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Norio Shimizu, Munechika Tani, Fumiaki Nihei