Patents by Inventor Fumiharu SHIBATA

Fumiharu SHIBATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190114465
    Abstract: This image acquisition apparatus includes a bottom surface position detection apparatus, and acquires an image of biological cells disposed in wells of a vessel. The bottom surface position detection apparatus includes a holder, a light irradiator, a detector, and a controller. The holder horizontally holds a vessel. The light irradiator irradiates a bottom portion of the vessel with a light beam. The detector detects a first reflected light beam reflected from a first bottom surface that is a bottom surface of the vessel and a second reflected light beam reflected from a second bottom surface that is a bottom surface of the wells. The controller calculates the position of the second bottom surface, based on a first peak position of the first reflected light beam and a second peak position of the second reflected light beam both detected by the detector.
    Type: Application
    Filed: April 5, 2017
    Publication date: April 18, 2019
    Applicant: SCREEN HOLDINGS CO., LTD.
    Inventors: Fumiharu SHIBATA, Ryosuke IKEZAWA, Masahiko KOKUBO
  • Publication number: 20160091794
    Abstract: A drawing method is to draw a pattern on a substrate. First, cumulative exposure amount distribution data containing a cumulative exposure amount to be applied to each position on the substrate is read. Next, a region R11 and a region R12 on the substrate are specified based on the cumulative exposure amount distribution data. The region R11 is a region where the cumulative exposure amount does not exceed Ma corresponding to a maximum exposure amount capable of being applied to the substrate in one exposure scanning by an exposure apparatus. The region R22 is a region where the cumulative exposure amount exceeds Ma. Then, pattern data containing information about an exposure amount for each position in a region including the region R11 is generated. Further, pattern data containing information about an exposure amount for each position in a region including the region R12 is generated.
    Type: Application
    Filed: September 21, 2015
    Publication date: March 31, 2016
    Inventors: Fumiharu SHIBATA, Yumiko HIRATO, Yasuyuki KOYAGI, Kazuhiro NAKAI