Patents by Inventor Fumiharu Takahashi
Fumiharu Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8820753Abstract: Disclosed is a lubricant sealing structure for a gear coupling, which can firmly prevent the leaking of the lubricant due to vibration or the like in the axial and radial directions inside the gear coupling. A sealing member is a cloth-inserted rubber 21 having flexibility. The cloth-inserted rubber 21 has a first end being fixed to a fixing member 24s on a cover plate 20 mounted on a side of an outer ring 7 and a second end being fixed to another fixing member 25s on a side of the drive shaft 10 in liquid tight manner in the axial direction of a drive shaft 10. Each of the first and second ends of the cloth-inserted rubber 21 has a face extending in a direction that is perpendicular to the axial direction. The cloth-inserted rubber 21 seals the lubricant at the face of said each of the first and second ends.Type: GrantFiled: April 26, 2011Date of Patent: September 2, 2014Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Fumiharu Takahashi, Akihiko Yano, Katsuhiko Shoda, Hisao Miyake, Shin Koga
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Publication number: 20120274033Abstract: Disclosed is a lubricant sealing structure for a gear coupling, which can firmly prevent the leaking of the lubricant due to vibration or the like in the axial and radial directions inside the gear coupling. A sealing member is a cloth-inserted rubber 21 having flexibility. The cloth-inserted rubber 21 has a first end being fixed to a fixing member 24s on a cover plate 20 mounted on a side of an outer ring 7 and a second end being fixed to another fixing member 25s on a side of the drive shaft 10 in liquid tight manner in the axial direction of a drive shaft 10. Each of the first and second ends of the cloth-inserted rubber 21 has a face extending in a direction that is perpendicular to the axial direction. The cloth-inserted rubber 21 seals the lubricant at the face of said each of the first and second ends.Type: ApplicationFiled: April 26, 2011Publication date: November 1, 2012Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Fumiharu TAKAHASHI, Akihiko YANO, Katsuhiko SHODA, Hisao MIYAKE, Shin KOGA
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Patent number: 7797936Abstract: An exhaust turbo supercharger is provided that is able to effectively prevent exhaust gas that has flowed into between a turbine housing and a bearing housing from leaking to outside of the device, while allowing an excellent level of workability in assembly and disassembly. Included is a turbine housing, into which exhaust gas from an internal combustion engine is introduced; a turbine wheel which is provided within the turbine housing and which is rotation-driven by the exhaust gas; a turbine shaft, one end of which is inserted into the turbine housing, and to which the turbine wheel is attached; a bearing which supports the turbine shaft; and a bearing housing which is connected to the turbine housing and inside of which the bearing is housed.Type: GrantFiled: February 9, 2007Date of Patent: September 21, 2010Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Noriyuki Hayashi, Yasuaki Jinnai, Seiichi Ibaraki, Fumiharu Takahashi, Yoh Akiyama
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Publication number: 20090151348Abstract: An exhaust turbo supercharger is provided that is able to effectively prevent exhaust gas that has flowed into between a turbine housing and a bearing housing from leaking to outside of the device, while allowing an excellent level of workability in assembly and disassembly. Included is a turbine housing, into which exhaust gas from an internal combustion engine is introduced; a turbine wheel which is provided within the turbine housing and which is rotation-driven by the exhaust gas; a turbine shaft, one end of which is inserted into the turbine housing, and to which the turbine wheel is attached; a bearing which supports the turbine shaft; and a bearing housing which is connected to the turbine housing and inside of which the bearing is housed.Type: ApplicationFiled: February 9, 2007Publication date: June 18, 2009Applicant: MITSKUBISHI HEAVY INDUSTRIES, LTD.Inventors: Noriyuki Hayashi, Yasuaki Jinnai, Seiichi Ibaraki, Fumiharu Takahashi, Yoh Akiyama
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Publication number: 20090008366Abstract: This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.Type: ApplicationFiled: September 11, 2008Publication date: January 8, 2009Applicant: TOSOH COPORATIONInventors: Yasushi HARA, Fumiharu Takahashi, Hiroaki Hayashi
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Publication number: 20080203060Abstract: In etching of silicon nitride with a phosphorus type, if etching is carried for a long time, silicon oxide tends to precipitate, and it has been impossible to constantly carry out the etching for a long period of time. By an etching method for silicon nitride using a composition comprising a phosphorus compound, a boron compound, a silicon compound and/or their fluorides thereof, there will be no precipitation of silicon oxide even when the composition is used for a long time. It is particularly preferred to further add nitric acid and/or a nitrate, whereby stability of selectivity will be increased.Type: ApplicationFiled: February 28, 2008Publication date: August 28, 2008Applicant: TOSOH CORPORATIONInventors: Yasushi HARA, Akinori SHIMONO, Fumiharu TAKAHASHI
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Patent number: 7354890Abstract: Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.Type: GrantFiled: August 15, 2005Date of Patent: April 8, 2008Assignee: Tosoh CorporationInventors: Yasushi Hara, Fumiharu Takahashi, Hiroaki Hayashi, Akinori Shimono
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Publication number: 20070161529Abstract: A cleaning composition for a semiconductor device-manufacturing apparatus comprising, based on the weight of the composition, 0.1-10% by weight of at least one fluorine compound selected from sodium fluoride, potassium fluoride, lithium fluoride and ammonium fluoride; 1-50% by weight of at least one phosphoric ingredient selected from phosphoric acid and a phosphoric acid salt; 0.5-35% by weight of hydrogen peroxide; 0-5% by weight of hydrofluoric acid, and the remainder of water, wherein the ratio (H2O2/F) by weight of hydrogen peroxide to fluorine in the total of the fluorine compound and the hydrofluoric acid is at least 4. The cleaning composition is used for cleaning semiconductor device-manufacturing apparatus having deposited thereon at least one deposited metal ingredient selected from metallic titanium, titanium oxide, titanium nitride, metallic copper, copper oxide, metallic tantalum, tantalum oxide and tantalum nitride to remove these deposited metal ingredients.Type: ApplicationFiled: December 21, 2006Publication date: July 12, 2007Applicant: TOSOH CORPORATIONInventors: Fumiharu Takahashi, Yasushi Hara, Hiroaki Hayashi, Akinori Shimono
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Publication number: 20060040839Abstract: Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.Type: ApplicationFiled: August 15, 2005Publication date: February 23, 2006Inventors: Yasushi Hara, Fumiharu Takahashi, Hiroaki Hayashi, Akinori Shimono
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Publication number: 20050227473Abstract: This etching composition for etching hafnium compound, includes a fluoride compound and a chloride compound. This method for etching a substrate, includes etching a film which contains hafnium compound and is formed on a substrate by using an etching composition, wherein the etching composition contains a fluoride compound and a chloride compound.Type: ApplicationFiled: March 17, 2005Publication date: October 13, 2005Inventors: Yasushi Iiara, Fumiharu Takahashi, Hiroaki Hayashi
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Patent number: 6337376Abstract: A method to prepare a polyolefin in the presence of a catalyst comprising: (A) a solid catalyst component prepared by reacting a homogenous solution consisting of (i) at least one member selected from the group consisting of metal magnesium and a hydroxylated organic compound, and oxygen-containing organic compounds of magnesium, (ii) at least one oxygen-containing organic compound of titanium and (iii) at least one silicon compound, first with (iv) at least one first organoaluminum halide compound of the formula: AlR5zX3−z wherein R5 is a hydrocarbon group having from 1 to 20 carbon atoms, X is a halogen atom, and 1≦z≦2, and wherein the atomic ratio of gram atoms of Al in the component (iv) to gram atoms of Mg in the component (i) (Al/Mg) is from 0.1 to 2.Type: GrantFiled: November 21, 1994Date of Patent: January 8, 2002Assignee: Tosoh CorporationInventors: Yutaka Naito, Fumiharu Takahashi, Mitsuhiro Mori, Yozo Kondo
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Patent number: 5481056Abstract: This invention relates to a process for the polymerization of polyolefins, in which .alpha.-olefins are polymerized in the presence of a catalyst system composed of: the solid catalyst component (A) obtained by reacting a magnesium compound with oxygen-containing organic compounds of a transition metal, aluminum and silicon, followed by further reacting with a halogenated organoaluminum compound, and the catalyst component (B) comprising of organoaluminum compound and/or organoaluminoxane compound. The catalyst system of this invention provides polymers having an excellent particle form and the molecular weight distribution being easily controlled in a wide range, in high activity, and copolymers having a narrow composition distribution range.Type: GrantFiled: July 20, 1993Date of Patent: January 2, 1996Assignee: Tosoh CorporationInventors: Fumiharu Takahashi, Yutaka Naito, Mitsuhiro Mori, Sadaki Nishimura