Abstract: Provided is an information processing device including: a control unit that performs position detection of an object, on which a light emitting unit or a reflective material is provided, on the basis of a captured image acquired by imaging of emitted light or reflected light of the object in a direction facing a side, on which the light emitting unit or the reflective material is provided, of the object, wherein the control unit adjusts algorithm for the position detection of the object according to an illuminance detection result of external light including at least a wavelength of the emitted light or the reflected light.

Abstract: A coating processing apparatus that applies a coating liquid containing an optical material includes a substrate holder that holds a substrate, a coating nozzle that ejects the coating liquid to the substrate held by the substrate holder, and a moving mechanism that relatively moves the substrate holder and the coating nozzle in an orthogonal direction.

Abstract: A coating processing apparatus that applies a coating liquid containing an optical material includes a substrate holder that holds a substrate, a coating nozzle that ejects the coating liquid to the substrate held by the substrate holder, and a moving mechanism that relatively moves the substrate holder and the coating nozzle in an orthogonal direction.

Abstract: A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

Abstract: Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n?1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n?1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.

Abstract: A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate moving with respect to light emitting elements; developing the photosensitive film having been subjected to exposure processing by irradiation by the light emitting elements; measuring a residual film thickness of the photosensitive film for each of the small blocks to obtain correlation data between the illuminance set for the small block and the residual film thickness; and obtaining a required illuminance of irradiation to each of the large blocks from a target residual film thickness of the photosensitive film set for each of the large blocks based on the correlation data.

Abstract: Formation of banded irregularities in a process liquid film formed on a substrate being carried by a flotation carrying system is reduced or suppressed effectively. Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n?1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n?1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.