Patents by Inventor Fumihiko Kobayashi

Fumihiko Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5442811
    Abstract: A loop testable radio transmitter/receiver includes a transmission system which includes a transmission frequency converting unit and a transmission signal filter unit. A receiving system is provided, including a receiving signal filter and a receiving frequency converter. The transmitter/receiver further includes a transmitter/receive sharing unit, a transmission signal looping unit for attenuating the transmission signal of the transmission system and for looping back it to the receiving system, and a shifter arranged to the output side of the receiving frequency converting unit in the receiving system for converting an intermediate frequency of a signal converted by the receiving frequency converting unit into the receiving input frequency of a modulator/demodulator.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: August 15, 1995
    Assignee: Fujitsu Limited
    Inventors: Fumihiko Kobayashi, Eiji Itaya
  • Patent number: 5371164
    Abstract: A room-temperature curable polyorganosiloxane composition comprising the following components (A) to (C): (A) 100 parts by weight of (1) a mixture of a terminally reactive polyorganosiloxane represented by the formula R.sup.1.sub.a (R.sub.2 O).sub.3-a SiZ[R.sub.2 SiO].sub.n SiR .sup.1.sub.2 ZSi(OR.sup.2).sub.3-a R.sup.1.sub.a ; (2) a silane represented by the formula R.sup.3.sub.b Si(OR.sup.4).sub.4-b or a partially hydrolyzed condensation product thereof; the amount of (A) (1) being from 85 to 100 parts by weight; (B) from 0.01 to 20 parts by weight of a curing catalyst; and (C) from 0.5 to 20 parts by weight of a polycondensation reaction product of an amino group-containing silane represented by the formula X.sub.c Si(WNH.sub.2)Y.sub.3-c and a silazane represented by the formula X.sub.d Y.sub.3-d SiNHSiY.sub.3-d X.sub.d ; where all symbols are defined in the specification.
    Type: Grant
    Filed: June 25, 1993
    Date of Patent: December 6, 1994
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Fumihiko Kobayashi, Shigeki Matsushita, Kazuhisa Ono, Tsuneo Motegi
  • Patent number: 5118755
    Abstract: A room temperature-curable polyorganosiloxane composition which can provide a cured elastic product having a smooth surface, comprising (A) a hydroxyl-terminated polyorganosiloxane, (B) a silane having at least two silicon-bonded ketoximato groups per molecule and/or a partial hydrolysis condensate of the silane, (C) a curing catalyst, and (D) an organozirconium compound.
    Type: Grant
    Filed: March 27, 1990
    Date of Patent: June 2, 1992
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Isao Endo, Fumihiko Kobayashi
  • Patent number: 5044291
    Abstract: A front operation panel is provided on a housing of an electrically controlled sewing machine, which provides a pattern list indicating a plurality of stitch patterns in a specific pattern group. One of the stitch patterns may be selected in direct reference to the pattern indication and the selected one is represented in a display section in the operational panel. The operational panel comprises a display board having the pattern list and the display section and a transparent cover superposed on the display board which includes a plurality of pressure-sensitive elements to be selectively depressed to designate the pattern indication in the pattern list. The display board may be switched to another information menu which is applicable to input operation of an original stitch pattern by successively inputting needle dropping points which should be enough to define a configuration of the original stitch pattern.
    Type: Grant
    Filed: July 12, 1990
    Date of Patent: September 3, 1991
    Assignee: Janome Sewing Machine Co., Ltd.
    Inventors: Fumihiko Kobayashi, Yoshiaki Sakata, Takumi Ando, Toru Hyodo
  • Patent number: 5021757
    Abstract: A band pass filter is comprised of one or more filter units each having a V-shaped microwave strip line provided with two variable capacity elements at its two open ends and a high frequency elimination element connected to the apex thereof through which a control voltage for the variable capacity elements is applied.
    Type: Grant
    Filed: November 27, 1989
    Date of Patent: June 4, 1991
    Assignee: Fujitsu Limited
    Inventors: Fumihiko Kobayashi, Isamu Umino
  • Patent number: 4878444
    Abstract: An electronic zigzag sewing machine is provided with a presser foot including a switch lever pivotable between a first and second position. During buttonhole stitching operation the switch lever remains in the first position, but it is shifted to the second position when either one of longitudinal ends of a buttonhole is detected. A photo-sensor is mounted to the presser foot to output a detection signal when the switch lever is in the second position. A pattern number designating a specific stitch pattern of the buttonhole stitches is renewed to the next in response to the detection signal from the photo-sensor. A control system is provided to nullify operation of the photo-sensor during production of bar tacks of the buttonhole stitches so that the pattern number is not renewed in areas of the bar tacks irrespective of output of the detection signal.
    Type: Grant
    Filed: April 29, 1988
    Date of Patent: November 7, 1989
    Inventors: Yasuro Sano, Akio Koide, Toru Hyodo, Fumihiko Kobayashi, Takayuki Kawasato, Yasuhiko Osanai
  • Patent number: 4867088
    Abstract: Predetermined pattern selecting and function selecting keys of an electronic sewing machine are employed for controlling the selection between normal operation of a stitch forming device and a built-in diagnosing device. The diagnosing device is enabled only when the power switch of the machine is on while the predetermined function selecting key is kept depressed, and the predetermined pattern selecting key is kept depressed for a predetermined time interval. The stitch forming device is enabled when the two predetermined keys are not depressed for the predetermined time interval.
    Type: Grant
    Filed: April 27, 1988
    Date of Patent: September 19, 1989
    Assignee: Janome Sewing Machine Co., Ltd.
    Inventors: Tohru Hyodo, Fumihiko Kobayashi
  • Patent number: 4760123
    Abstract: Room temperature curing polyorganosiloxane compositions comprising:(A) 100 parts by weight of a composition containing(1) a polyorganosiloxaneR.sup.1.sub.a (R.sup.2 O).sub.3-a SiO[R.sup.2 SiO].sub.n Si(OR.sup.2).sub.3-a R.sup.1.sub.awherein R represents a substituted or unsubstituted monovalent hydrocarbon group; which the viscosity of (A) at 25.degree. C. may be 100 to 500,000 cP,which is reactive at the terminal groups and(2) a silane of the formula:R.sup.3.sub.b Si(OR.sup.4).sub.4-bwherein R represents substituted or unsubstituted monovalent hydrocarbon groups; b is a numeral of 0 or 1,or a hydrolyzate thereof,wherein (A)(1) is 85 to 100% by weight of the total of (A)(1) and (A)(2);(B) 0.01 to 10 parts by weight of a curing catalyst;(C) 0.5 to 10 parts by weight of a nitrogen containing silicon compound, wherein a nitrogen atom is bonded to a silicon atom via one or more carbon atoms and the nitrogen atom is also bonded directly to the same silicon atom or another silicon atom; and(D) 0.
    Type: Grant
    Filed: September 9, 1986
    Date of Patent: July 26, 1988
    Assignee: Toshiba Silicone Co., Ltd
    Inventors: Takafumi Imai, Fumihiko Kobayashi
  • Patent number: 4537944
    Abstract: The present invention provides a room temperature curable polyorganosiloxane composition comprising:(A) 100 parts by weight in total of:(1) a polydiorganosiloxane of the general formula: ##STR1## (2) a silane of the general formula:R.sub.b.sup.3 Si(OR.sup.4).sub.4-b(B) 0.01 to 10 parts by weight of a curing catalyst;(C) 0.5 to 10 parts by weight of a nitrogen-containing silicon compound in which the nitrogen atom is bonded with a silicon atom through one or more carbon atoms and said nitrogen atom is further bonded directly with said silicon atom or another silicon atom; and(D) 0.05 to 50 parts by weight of a polyoxyalkylene chain-containing compound.
    Type: Grant
    Filed: June 21, 1984
    Date of Patent: August 27, 1985
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Takafumi Imai, Fumihiko Kobayashi