Abstract: A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.

Abstract: A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.

Abstract: A method of manufacturing a semiconductor wafer, comprising the step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by using an abrasive cloth with a semiconductor wafer sink rate different in polishing from that of the other abrasive cloth for one of a polishing cloth (14) on an upper surface plate (12) and a polishing cloth (15) on a lower surface plate (13) so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer (W), or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.

Abstract: A door member opener apparatus for a vehicle includes an engaging mechanism, a lock mechanism, a clearing mechanism, and an ECU (electronic control unit). The engaging mechanism includes a striker and a claw member that rotatively moves to engage with the striker. The engaging mechanism engages a tailgate with a car body. The lock mechanism regulates rotative movement of the claw member. The clearing mechanism clears the regulation of the rotative movement of the claw member when a handle member is operated. The ECU sets the amount of time before the lock mechanism can regulate the rotative movement of the claw member equal to a normal driving time.

Abstract: A door member opener apparatus for a vehicle includes an engaging mechanism, a lock mechanism, a clearing mechanism, and an ECU. The engaging mechanism includes a striker and a claw member that rotatively moves to engage with the striker. The engaging mechanism engages a tailgate with a car body. The lock mechanism regulates rotative movement of the claw member. The clearing mechanism clears the regulation of the rotative movement of the claw member when a handle member is operated. The ECU sets the amount of time before the lock mechanism can regulate the rotative movement of the claw member equal to a normal driving time.

Abstract: An object of the present invention is to provide a semiconductor wafer having a front and a back surfaces polished so as to have different glossiness from each other, yet with a lower cost. The glossiness of the front surface and the back surface can be selected arbitrarily. In a double-sided polisher with no sun gear, silicon wafers W are inserted in respective holding holes 11a of a carrier plate 11. The wafers W are placed with their back surfaces facing up. An expanded urethane foam pad 14 is pressed against the back surfaces of the wafers W and a non-woven fabric pad 15 is pressed against the front surfaces of the wafers W. A carrier holder 20 and thus the carrier plate 11 are then driven to make a circular motion associated with no rotation on their own axes within a horizontal plane while supplying a slurry to the wafers W from an upper surface plate 12 side.

Abstract: A laminated cloth which comprises (A) a cloth and (B) a crosslinking polyvinyl chloride skin layer, and optionally (C) a polyvinyl chloride layer as a primary coat for the layer (B), said laminated cloth having improved deep drawing properties and excellent tolerant to vacuum forming and being useful as a covering for interior trims of automobiles and other vacuum forming products and also as a surface decorating material for various products.

Abstract: A skin covering for trims of automobiles having three layer structure comprising(a) a surface layer comrising a PVC having a mean degree of polymerization (P) of 2,000 or more (high polymerization PVC),(b) a foam layer comprising a blend of a crosslinking PVC and a PVC having a P of less than 1,500 (low polymerization PVC) and a foaming agent, and(c) a back layer comprising a low polymerization PVC,said skin covering having excellent processability with the cloth by high frequency welding and excellent vacuum forming properties and being useful for the facing of trims of automobiles.

Abstract: A combustion chamber system of a kerosine internal combustion engine including a main combustion chamber and an auxiliary combustion chamber both of which are defined in a cylinder head and are spaced from each other by a partition. A plurality of communication holes through which these main and auxiliary combustion chambers communicate with each other are made in the partition. The main combustion chamber has a suction port and an exhaust port opened thereto which are adapted to be opened and closed by a suction valve and an exhaust valve, respectively. The open ends of the communication holes on the side of the main combustion chamber are pointed to the upper surface of a piston located in the vicinity of a top dead center thereof, and a mixture of a theoretical or richer fuel ratio is fed into the main combustion chamber.

Abstract: A novel cholesterol oxidase can be obtained by culturing a strain belonging to the Genus Corynebacterium and having an ability to produce cholesterol oxidase in a medium containing cholesterol.

Abstract: A process for producing 3',5'-cyclic adenylic acid in a high yield at a lower price by culturing a strain belonging to the genus selected from the group consisting of Corynebacterium, Arthrobacter and Microbacterium such as, for example, Corynebacterium murisepticum No. 7-10 (ATCC 21977), Arthrobacter 11-211 (ATCC 21978) Microbacterium No. 205-CM7 (ATCC 21979), Microbacterium No. 205-CM-XA3 (ATCC 21980), or Microbacterium No. 205-MP-197 (ATCC 21976) in a medium containing nutrient sources such as, carbon sources, nitrogen sources, inorganic salts and the like but containing no precursors and having a pH of 5-9 at a temperature of 20.degree.-40.degree. C under aerobic condition. The obtained 3',5'-cyclic adenylic acid is well-known for its participation in various biochemical reactions in vivo and for its active role as a mediator to various hormones. It has therefore always been highly evaluated biochemical reagent.

Abstract: 3' ,5'-Cyclic-adenylic acid or 3' ,5'-cyclic-deoxadenylic acid can be obtained in a high purity and a high yield by adding a water-soluble organic solvent such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, tert-butyl alcohol, acetone, N,N'-dimethylformamide, dioxane, tetrahydrafuran, ethyleneglycolmonomethylether and the like singly or in combination to an aqueous solution containing as impurities one or more kinds of nucleotides other than 3' ,5'-cyclicadenylic acid and 3' ,5'-cyclic-deoxyadenylic acid, nucleosides, nucleobases, colored substances, proteins and the like in addition to 3' ,5'-cyclic-adenylic acid or 3', 5'-cyclic-deoxyadenylic acid.The said 3' ,5'-cyclic-adenylic acid or 3' ,5'-cyclic-deoxyadenylic acid are useful and valuable as a biochemical reagent.