Patents by Inventor Fumihiro Toyokawa

Fumihiro Toyokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10961327
    Abstract: Provided is a rubber material that is well-balanced in terms of tensile strength, low hysteresis loss property, wet grip property, and abrasion resistance. A hydrogenated conjugated diene-based polymer which is a hydrogenation product of a conjugated diene-based polymer including butadiene-derived structural units is produced by a method comprising a step of preparing a conjugated diene-based polymer having, at a side chain moiety thereof, a functional group capable of interacting with silica; and a step of hydrogenating the conjugated diene-based polymer so as to achieve a hydrogenation rate of 80 to 99% of butadiene-derived structural units included in the conjugated diene-based polymer.
    Type: Grant
    Filed: September 6, 2016
    Date of Patent: March 30, 2021
    Assignee: JSR CORPORATION
    Inventors: Takumi Adachi, Hirofumi Senga, Fumihiro Toyokawa, Naoya Nosaka, Takaomi Matsumoto, Ryoji Tanaka
  • Publication number: 20190062539
    Abstract: There is provided a hydrogenated conjugated diene-based rubber which can give a crosslinked rubber having high strength and excellent low fuel consumption performance and can give a rubber composition having excellent formability. A hydrogenated conjugated diene-based rubber having a hydrogenation rate of butadiene unit of 90% or more, wherein, in the molecular weight distribution of the hydrogenated conjugated diene-based rubber as determined by a gel permeation chromatographic method, when a peak area of a molecular weight of 1,000 to 250,000 is taken as AL and a peak area of a molecular weight of 250,000 or more is taken as AH, the ratio of AL to the total area of AL and AH is 0.5% to 20%.
    Type: Application
    Filed: March 1, 2017
    Publication date: February 28, 2019
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Hirofumi SENGA, Fumihiro TOYOKAWA
  • Patent number: 10146131
    Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: December 4, 2018
    Assignee: JSR CORPORATION
    Inventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Gouji Wakamatsu, Yoshio Takimoto, Katsuhisa Mizoguchi, Takashi Okada, Takaaki Uno, Takeshi Endo, Masaki Moritsugu
  • Publication number: 20180251576
    Abstract: Provided is a rubber material that is well-balanced in terms of tensile strength, low hysteresis loss property, wet grip property, and abrasion resistance. A hydrogenated conjugated diene-based polymer which is a hydrogenation product of a conjugated diene-based polymer including butadiene-derived structural units is produced by a method comprising a step of preparing a conjugated diene-based polymer having, at a side chain moiety thereof, a functional group capable of interacting with silica; and a step of hydrogenating the conjugated diene-based polymer so as to achieve a hydrogenation rate of 80 to 99% of butadiene-derived structural units included in the conjugated diene-based polymer.
    Type: Application
    Filed: September 6, 2016
    Publication date: September 6, 2018
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Hirofumi SENGA, Fumihiro TOYOKAWA, Naoya NOSAKA, Takaomi MATSUMOTO, Ryoji TANAKA
  • Publication number: 20180207983
    Abstract: Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer comprising a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, the hydrogenated conjugated diene polymer is obtained by hydrogenating a polymer in which a vinyl bond content in the structural unit derived from butadiene is 50 mol % or less, an amount of the structural unit derived from the aromatic vinyl compound is 5 to 25 mass % with respect to entire structural units derived from monomers of the polymer, and a hydrogenation rate of the structural unit derived from butadiene is 91% to 99%.
    Type: Application
    Filed: July 21, 2016
    Publication date: July 26, 2018
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Ryoji TANAKA, Takaomi MATSUMOTO, Fumihiro TOYOKAWA, Naoya NOSAKA
  • Publication number: 20180201066
    Abstract: Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer having a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, an amount of the structural unit derived from the aromatic vinyl compound is 30 mass % or more with respect to entire structural units derived from monomers of the polymer, and a hydrogenation rate of the structural unit derived from butadiene is 80% to 99%.
    Type: Application
    Filed: July 21, 2016
    Publication date: July 19, 2018
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Ryoji TANAKA, Takaomi MATSUMOTO, Fumihiro TOYOKAWA, Naoya NOSAKA
  • Publication number: 20180201065
    Abstract: Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer comprising a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, the hydrogenated conjugated diene polymer is obtained by hydrogenating a polymer in which a vinyl bond content in structural unit derived from butadiene is 55 mol % or more, and a hydrogenation rate of the structural unit derived from butadiene is 91% to 99%.
    Type: Application
    Filed: July 21, 2016
    Publication date: July 19, 2018
    Applicant: JSR CORPORATION
    Inventors: Takumi ADACHI, Ryoji TANAKA, Takaomi MATSUMOTO, Fumihiro TOYOKAWA, Naoya NOSAKA
  • Patent number: 9696626
    Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: July 4, 2017
    Assignee: JSR CORPORATION
    Inventors: Fumihiro Toyokawa, Shin-ya Nakafuji, Gouji Wakamatsu
  • Patent number: 9581905
    Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: February 28, 2017
    Assignee: JSR CORPORATION
    Inventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Goji Wakamatsu, Shingo Takasugi, Tooru Kimura
  • Publication number: 20160259247
    Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.
    Type: Application
    Filed: May 19, 2016
    Publication date: September 8, 2016
    Applicant: JSR CORPORATION
    Inventors: Fumihiro TOYOKAWA, Shin-ya NAKAFUJI, Gouji WAKAMATSU
  • Patent number: 9400429
    Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: July 26, 2016
    Assignee: JSR CORPORATION
    Inventors: Fumihiro Toyokawa, Shin-ya Nakafuji, Gouji Wakamatsu
  • Publication number: 20160085152
    Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.
    Type: Application
    Filed: December 4, 2015
    Publication date: March 24, 2016
    Applicant: JSR CORPORATION
    Inventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Goji WAKAMATSU, Shingo TAKASUGI, Tooru KIMURA
  • Patent number: 9250526
    Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: February 2, 2016
    Assignee: JSR CORPORATION
    Inventors: Tomoaki Seko, Fumihiro Toyokawa, Yuushi Matsumura, Tooru Kimura
  • Publication number: 20160011512
    Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
    Type: Application
    Filed: September 23, 2015
    Publication date: January 14, 2016
    Applicant: JSR CORPORATION
    Inventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Gouji WAKAMATSU, Yoshio TAKIMOTO, Katsuhisa MIZOGUCHI, Takashi OKADA, Takaaki UNO, Takeshi ENDO, Masaki MORITSUGU
  • Publication number: 20150185613
    Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.
    Type: Application
    Filed: March 10, 2015
    Publication date: July 2, 2015
    Applicant: JSR CORPORATION
    Inventors: Fumihiro TOYOKAWA, Shin-ya Nakafuji, Gouji Wakamatsu
  • Patent number: 8691496
    Abstract: A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.
    Type: Grant
    Filed: September 11, 2012
    Date of Patent: April 8, 2014
    Assignee: JSR Corporation
    Inventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
  • Publication number: 20130233826
    Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 12, 2013
    Applicant: JSR CORPORATION
    Inventors: Tomoaki SEKO, Fumihiro TOYOKAWA, Yuushi MATSUMURA, Tooru KIMURA
  • Publication number: 20130004900
    Abstract: A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.
    Type: Application
    Filed: September 11, 2012
    Publication date: January 3, 2013
    Applicant: JSR Corporation
    Inventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
  • Patent number: 8288073
    Abstract: This invention provides a method for resist under layer film formation, which can form a resist under layer film which can function as an anti-reflection film, is excellent in pattern transfer properties and etching resistance, and does not cause bending of a pattern even in the transfer of a fined pattern, and a composition for the resist under layer film for use in the method, and a method for pattern formation. The method for resist under layer film formation comprises the steps of coating a composition for resist under layer film formation (for example, a composition comprising a compound having a phenolic hydroxyl group, a solvent, and an accelerator) onto a substrate to be processed, and treating the formed coating film under an oxidizing atmosphere having an oxygen concentration of not less than 1% by volume and a temperature of 300° C. or higher to form a resist under layer film.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: October 16, 2012
    Assignee: JSR Corporation
    Inventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
  • Publication number: 20100178620
    Abstract: A method for forming an inverted pattern includes forming a photoresist pattern on a substrate, filling a space formed by the photoresist pattern with a resin composition including a polysiloxane and a solvent, and removing the photoresist pattern to form an inverted pattern. The resin composition includes (A) a polysiloxane obtained by hydrolysis and condensation of two types of hydrolysable silane compounds having a specific structure, and (B) an organic solvent containing an alcohol or ether having a specific structure.
    Type: Application
    Filed: November 24, 2009
    Publication date: July 15, 2010
    Applicant: JSR Corporation
    Inventors: Satoshi DEI, Kyoyu Yasuda, Koichi Hasegawa, Fumihiro Toyokawa, Masato Tanaka, Keiji Konno