Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR and excellent resolution can be obtained, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin A including a repeating unit a represented by Formula (1), which has a photoacid generating group represented by Formula (c) in a side chain, and a repeating unit b having a group which is decomposed by action of acid to generate a polar group, in which a content of the repeating unit a is 0.40 to 1.

Abstract: A diagnostic apparatus, for diagnosing a state of equipment including a rotating component that rotates by force transmitted from a rotating shaft, includes: a vibration information acquisition section for acquiring vibration information including waveform information of vibration of the rotating component; an analysis section for decomposing a vibration waveform into frequency components and outputting values of vibration levels for each frequency component; and a determination section for determining a presence or absence of an abnormality in at least one of the rotating shaft and the rotating component. For a range from a first frequency, which is smaller than a rotation frequency of the rotating shaft, to the rotation frequency, the determination section compares, for each frequency component, a value of a vibration level with a normal value thereof, and determine a presence or absence of an abnormality in at least one of the rotating shaft and the rotating component.

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more, the method containing a step 1 of charging at least a resin of which polarity increases by an action of an acid, a photoacid generator, and a solvent as raw materials into a stirring tank, and a step 2 of stirring the raw materials in the stirring tank. A liquid temperature in the stirring tank is controlled to be equal to or lower than a 3.0° C. higher temperature than a liquid temperature at a start of the step 2 throughout the entire step 2, and the control of the liquid temperature in the stirring tank in the step 2 is performed by passing an inert gas through the stirring tank.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) and a resin (B) which include a repeating unit having an acid-decomposable group, and the acid-decomposable group in the resin (A) and the acid-decomposable group in the resin (B) have the same structures. Regarding the resin (A) and the resin (B), |GA?GB| is from 5% by mole to 20% by mole, SA/SB is 10/90 to 90/10, |MwA?MwB| is from 100 to 5,000, and |MwA/MnA?MwB/MnB| is 0.05 or more.

Abstract: A diagnosis system performs, while a vehicle is being driven, a diagnosis of a rotation portion of a rotating electrical machine included in the vehicle. The diagnosis system includes a measurement unit that, when performing the diagnosis of the rotation portion, stops charging of a storage battery included in the vehicle from the rotating electrical machine, and measures an inductive voltage of the rotating electrical machine generated by a rotation of the rotation portion, and a judgment unit that judges that there is an anomaly in the rotation portion when a magnitude of the inductive voltage is equal to or larger than a predetermined value.

Abstract: A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising: preparing an intermediate solution which includes a photoacid generator and a solvent; and mixing the intermediate solution with at least a resin to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.

Abstract: A part management apparatus may include an acquisition unit configured to acquire part information indicating a part having a symptom of a failure among a plurality of parts configuring a drive mechanism mounted to a vehicle. The part management apparatus may include an identification unit configured to refer to a storage unit that is configured to store a material configuring each of the plurality of parts to identify a material of the part indicated by the part information. The part management apparatus may include a notification unit configured to notify a material management apparatus configured to manage an inventory of a material of a part, of information related to the material of the part.

Abstract: A vehicle management apparatus may include a collection unit configured to collect data indicating a state of a vehicle based on a detection result of a sensor configured to detect the state of the vehicle from a plurality of vehicles. The vehicle management apparatus may include a classification unit configured to classify the plurality of vehicles into a plurality of group according to a predetermined algorithm based on the data of each of the plurality of vehicles. The vehicle management apparatus may include an identification unit configured to identify, when a faulty vehicle in which a failure has occurred is present among the plurality of vehicles, another vehicle belonging to a group to which the faulty vehicle belongs from among a plurality of groups as a failure symptom vehicle having a symptom of occurrence of a failure.

Abstract: A failure symptom sensing system may comprise a determination unit configured to determine whether a traveling state of a vehicle after a predetermined time period is in a predetermined traveling state based on location information of the vehicle and a driving history information of the vehicle. A failure symptom sensing system may comprise a sensing unit configured to acquire data from a sensor configured to sense a state of the vehicle to sense whether a symptom of failure of the vehicle exists based on the data when the traveling state of the vehicle after the predetermined time period is determined to be the predetermined traveling state.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, (P) an amine oxide, and (D) an acid diffusion control agent (provided that acid diffusion control agents corresponding to the amine oxide are excluded), in which a content of the amine oxide (P) is from 0.01 ppm to 1,000 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, and a mass ratio of the acid diffusion control agent (D) to the amine oxide (P) is more than 1 and 10,000 or less.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO3?, SO42?, Cl?, and Br?, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition, used for forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more, and for being exposed to actinic rays having a wavelength of 200 to 300 nm or radiation, in which the transmittance, with respect to light at a wavelength of 248 nm, of an actinic ray-sensitive or radiation-sensitive film having a film thickness of 12 ?m, which is formed using the actinic ray-sensitive or radiation-sensitive resin composition, is 5% or more, and a pattern having an excellent sensitivity as well as an excellent cross-sectional shape can be formed by the actinic ray-sensitive or radiation-sensitive resin composition in a case where an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more is exposed to light at a wavelength of 200 to 300 nm.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155° C. or higher, a compound (B) having a glass transition temperature of 150° C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130° C. to 170° C.

Abstract: A pattern forming method includes the following steps i), ii), and iii); i) a step of forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of more than 9 ?m and 20 ?m or less, using an actinic ray-sensitive or radiation-sensitive composition including a solvent (S) satisfying specific conditions; ii) a step of irradiating the actinic ray-sensitive or radiation-sensitive film with actinic rays or radiation; and iii) a step of developing the actinic ray-sensitive or radiation-sensitive film irradiated with actinic rays or radiation, using a developer.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin which has a repeating unit having an alkyleneoxy chain and a repeating unit having an aromatic group, and has a concentration of the solid content of 10% by mass or more. A pattern forming method has (i) forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more on a substrate with an actinic ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit having an alkyleneoxy chain.

Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155° C. or higher, a compound (B) having a glass transition temperature of 150° C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130° C. to 170° C.

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition, used for forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more, and for being exposed to actinic rays having a wavelength of 200 to 300 nm or radiation, in which the transmittance, with respect to light at a wavelength of 248 nm, of an actinic ray-sensitive or radiation-sensitive film having a film thickness of 12 ?m, which is formed using the actinic ray-sensitive or radiation-sensitive resin composition, is 5% or more, and a pattern having an excellent sensitivity as well as an excellent cross-sectional shape can be formed by the actinic ray-sensitive or radiation-sensitive resin composition in a case where an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more is exposed to light at a wavelength of 200 to 300 nm.

Abstract: The present invention provides a pattern forming method which can be suitably applied to grayscale exposure since a deviation of the thickness among production lots is hardly generated, and an actinic ray-sensitive or radiation-sensitive resin composition. The pattern forming method of the present invention is a pattern forming method having a step A of forming a film having a thickness T on a substrate, using an actinic ray-sensitive or radiation-sensitive resin composition including a resin whose solubility in a developer changes by the action of an acid and an acid generator, a step B of exposing the film, and a step C of developing the exposed film using a developer to form a pattern, in which the film formed in the step A satisfies at least one of the following condition 1 or 2. Condition 1: In a case where the thickness T of the film is 800 nm or more, the value of ? is less than 10,000. Condition 2: In a case where the thickness T of the film is less than 800 nm, the value of ? is less than 5,000.