Patents by Inventor Fumiko Nakamura

Fumiko Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5594016
    Abstract: Naphthalene derivatives represented by the formula (I): ##STR1## wherein the symbol ##STR2## --X-- represents --O-- or --S--, .dbd.Y-- represents .dbd.N-- or .dbd.CR.sup.5 --, R.sup.1, C.sup.2, R.sup.3, R.sup.4 and R.sup.5 represent hydrogen, halogen, alkyl and the like,R.sup.6 represents hydrogen, alkyl, aryl and the like,n represents an integer of 0 to 3, --- represents a single bond or a double bond, which are useful for reducing blood sugar and blood lipid levels are provided.
    Type: Grant
    Filed: October 23, 1995
    Date of Patent: January 14, 1997
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hiroaki Ueno, Takayuki Oe, Ichiro Suehiro, Fumiko Nakamura
  • Patent number: 4987552
    Abstract: Automatic editing equipment for a video tape pertaining to the makeup methods includes a memory medium receiving unit connected to a central processing unit and for receiving a plurality of memory media set every respective items or devisions of at least shape of face, eye, nose and mouth so as to cover features or looks of various persons and in which makeup methods are memorized in correspondence with various specifications in the respective items or divisions. A makeup method select circuit connected to the memory medium receiving unit makes comparisons between signals on the side of input information related to the form of face from individual customers and signals on the side of the memory medium receiving unit, thus to select makeup methods conforming to the input information from those in the plurality of memory media and combine them with each other.
    Type: Grant
    Filed: February 8, 1988
    Date of Patent: January 22, 1991
    Inventor: Fumiko Nakamura