Patents by Inventor Fumio Hide

Fumio Hide has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle beam writing method
    Patent number: 7759659
    Abstract: A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: July 20, 2010
    Assignee: NuFlare Technology, Inc.
    Inventors: Takayuki Abe, Tetsuo Yamaguchi, Fumio Hide
  • CHARGED PARTICLE BEAM WRITING METHOD
    Publication number: 20090057576
    Abstract: A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.
    Type: Application
    Filed: August 18, 2008
    Publication date: March 5, 2009
    Applicant: NuFlare Technology, Inc.
    Inventors: Takayuki Abe, Tetsuo Yamaguchi, Fumio Hide
  • Charged particle beam writing method
    Patent number: RE44179
    Abstract: A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.
    Type: Grant
    Filed: July 19, 2012
    Date of Patent: April 30, 2013
    Assignee: Nuflare Technology, Inc.
    Inventors: Takayuki Abe, Tetsuo Yamaguchi, Fumio Hide