Patents by Inventor Fumio Kita

Fumio Kita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7473521
    Abstract: The invention relates to an alternative composite mask that is substantially composed of a transparent support film coated with a transparent polymer matrix that contains light-absorbing pigment particles or metal particles having an average particle size d50 ranging between 0.5 and 10 ?m.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: January 6, 2009
    Assignee: Tomoegawa Co., Ltd.
    Inventors: Takamasa Harada, Fumio Kita, Andreas Zimmermann, Andreas Altherr, Martin Mennig, Peter W. Oliveira, Helmut Schmidt
  • Patent number: 7431858
    Abstract: The invention relates to a method for microstructuring electronic components, which yields high resolutions (?200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a).
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: October 7, 2008
    Assignee: AZ Electronic Materials (Germany) GmbH
    Inventors: Walter Spiess, Fumio Kita, Michael Meier, Andreas Gier, Martin Mennig, Peter W Oliveira, Helmut Schmidt
  • Publication number: 20070025121
    Abstract: A surface light source comprising a light emitting part (11) consisting of a single spot light source, and a light guide plate (12), wherein a reflection plane (13) is provided on the back side of the light guide plate and a prism pattern (15) is also provided. A directional light diffusion film (14) consisting of at least two light scattering/transmitting phases having different refractive indexes, where one phase having a larger refractive index includes a large number of regions having a columnar structure extending in the thickness direction of the film and the columnar structure is inclining against the normal direction of the film at an angle of 5-60°, is arranged on the light exit surface side of the light guide plate (12) such that the scattering direction of the directional light diffusion film becomes the direction of uneven luminance.
    Type: Application
    Filed: July 15, 2004
    Publication date: February 1, 2007
    Inventors: Takamasa Harada, Fumio Kita, Hiroki Kanao
  • Publication number: 20060268571
    Abstract: A surface light source device comprises a light emitting section (11) made of a single spot light source, a light guide plate (12), a reflective surface (13) provided on the back side of the light guide plate, and a prism pattern (15). On the light emitting surface side of the light guide plate (12), there is provided a directional light scattering film (14) consisting of at least two phases having different refractive indexes and scattering light when transmitting it. One phase of a larger refractive index includes a plenty of areas having a columnar structure extending in the thickness direction of a film and arranged to be perpendicular to a normal to the film, and exhibiting a maximum scattering angle of 10-40°.
    Type: Application
    Filed: July 15, 2004
    Publication date: November 30, 2006
    Inventors: Takamasa Harada, Fumio Kita, Hiroki Kanao
  • Publication number: 20050224452
    Abstract: The invention relates to a method for microstructuring electronic components, which yields high resolutions (?200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a).
    Type: Application
    Filed: April 9, 2003
    Publication date: October 13, 2005
    Inventors: Walter Spiess, Fumio Kita, Michael Meier, Andreas Gier, Martin Mennig, Helmut Schmidt
  • Publication number: 20050101698
    Abstract: The invention relates to solid or gel-type nanocomposite material which can be polymerised, containing a) 4.9 95.9 wt. % of a soluble polymer; b) 4-95 wt. % of a partially or totally condensed silane selected from the group of epoxyalkoxysilanes, alkoxysilanes and alkylalkoxysilanes, the silane having an inorganic condensation degree of between 33-100% and an organic conversion degree of between 0-95%; c) 0-60 wt. % of an acrylate; d) 0.1-50 wt. % of surface modified nanometric particles selected from the group of oxides, sulphides, selenides, tellurides, halogenides, carbides, arsenides, antimonides, nitrides, phosphides, carbonates, carboxylates, phosphates, sulphates, silicates, titanates, zirconates, aluminates, stannates, plumbates and a mixed oxides; e) 0-50 wt.-% of a plasticiser, f) 0-5 wt.
    Type: Application
    Filed: January 3, 2003
    Publication date: May 12, 2005
    Inventors: Takamasa Harada, Fumio Kita, Andreas Zimmermann, Ulrike Dellwo, Martin Mennig, Peter Oliveira, Helmut Schmidt, Heike Schneider
  • Publication number: 20050008846
    Abstract: The invention relates to an alternative composite mask that is substantially composed of a transparent support film coated with a transparent polymer matrix that contains light-absorbing pigment particles or metal particles having an average particle size d50 ranging between 0.5 and 10 ?m.
    Type: Application
    Filed: December 6, 2002
    Publication date: January 13, 2005
    Inventors: Takamasa Harada, Fumio Kita, Andreas Zimmermann, Andreas Altherr, Martin Mennig, Peter Oliveira, Helmut Schmidt
  • Patent number: 6252067
    Abstract: A method of preparing oxoquazepam which comprises reacting 2,2,2-trifluoroethyl trifluoromethanesulfonate with 7-chloro-1,3-dihydro-5-(2-fluorophenyl)-2H-1,4-benzodiazepin-2-one in tetrahydrofuran or ethyl acetate in the presence of potassium carbonate under reflux. According to the method of the present invention, high purity oxoquazepam can be manufactured in high yields.
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: June 26, 2001
    Assignee: SSP Co., Ltd.
    Inventors: Masaki Ogawa, Fumio Kita