Patents by Inventor Fumio Naito

Fumio Naito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9944776
    Abstract: In order to provide a rubber composition having high transparency, toughness and heat-resisting property, the present invention can provide a composition comprising a neodymium-catalyzed isoprene rubber (IR) component; and a rubber polymer (RB) component selected from the group consisting of BR, 1,2-polybutadiene rubber, and SBR, wherein the amount of IR is from about 5 to 95 mass parts with the proviso that the total amount of IR and RB is 100 mass parts, wherein the composition is substantially free of silica, wherein the composition has haze of less than about 20%, and wherein the composition has Type A Durometer hardness (0 sec) of about 30 or more.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: April 17, 2018
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Fumio Naito, Yoshikatsu Nakazawa, Norio Masuko, Arwin van der Waal
  • Patent number: 9840600
    Abstract: The present invention provides a process for forming an article from a diene rubber, comprising: providing a raw diene rubber substance comprising 1,2-polybutadiene rubber component; adding to the raw diene rubber substance a peroxide as a vulcanizing agent; softening the raw diene rubber at a first temperature of not more than 200° C.; vulcanizing the diene rubber at a second temperature of not more than 200° C., with contacting the diene rubber to an ambient atmosphere; and forming from the vulcanized diene rubber an article.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: December 12, 2017
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Fumio Naito, Yoshikatsu Nakazawa
  • Publication number: 20160289400
    Abstract: The present invention provides a process for forming an article from a diene rubber, comprising: providing a raw diene rubber substance comprising 1,2-polybutadiene rubber component; adding to the raw diene rubber substance a peroxide as a vulcanizing agent; softening the raw diene rubber at a first temperature of not more than 200° C.; vulcanizing the diene rubber at a second temperature of not more than 200° C., with contacting the diene rubber to an ambient atmosphere; and forming from the vulcanized diene rubber an article.
    Type: Application
    Filed: March 29, 2016
    Publication date: October 6, 2016
    Applicant: KRATON POLYMERS U.S. LLC
    Inventors: FUMIO NAITO, YOSHIKATSU NAKAZAWA
  • Patent number: 9422422
    Abstract: In order to provide a rubber composition having high transparency and toughness, the present invention can provide a crosslinked rubber composition, being substantially free of silica, comprising a first olefin polymer having refractive index of between 1.500 to 1.525 at 23 degree C.; and a second olefin polymer which is different from the first olefin polymer, wherein the composition has haze of 20% or less on 2 mm thick sheet, measured according to JIS K7136, and wherein the composition has Type A Durometer hardness (0 sec) of 35 or more, measured according to JIS K6253.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: August 23, 2016
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Fumio Naito, Yoshikatsu Nakazawa
  • Publication number: 20160060437
    Abstract: In order to provide a rubber composition having high transparency, toughness and heat-resisting property, the present invention can provide a composition comprising a neodymium-catalyzed isoprene rubber (IR) component; and a rubber polymer (RB) component selected from the group consisting of BR, 1,2-polybutadiene rubber, and SBR, wherein the amount of IR is from about 5 to 95 mass parts with the proviso that the total amount of IR and RB is 100 mass parts, wherein the composition is substantially free of silica, wherein the composition has haze of less than about 20%, and wherein the composition has Type A Durometer hardness (0 sec) of about 30 or more.
    Type: Application
    Filed: August 24, 2015
    Publication date: March 3, 2016
    Applicant: KRATON POLYMERS U.S. LLC
    Inventors: Fumio NAITO, Yoshikatsu Nakazawa, Norio Masuko, Arwin van der Waal
  • Publication number: 20160009907
    Abstract: In order to provide a rubber composition having high transparency and toughness, the present invention can provide a crosslinked rubber composition, being substantially free of silica, comprising a first olefin polymer having refractive index of between 1.500 to 1.525 at 23 degree C.; and a second olefin polymer which is different from the first olefin polymer, wherein the composition has haze of 20% or less on 2 mm thick sheet, measured according to JIS K7136, and wherein the composition has Type A Durometer hardness (0 sec) of 35 or more, measured according to JIS K6253.
    Type: Application
    Filed: January 27, 2014
    Publication date: January 14, 2016
    Applicant: KRATON POLYMERS U.S. LLC
    Inventors: Fumio NAITO, Yoshikatsu Nakazawa
  • Patent number: 6472259
    Abstract: A method for manufacturing a semiconductor device comprising a nonvolatile memory transistor of a stacked gate structure having a floating gate and a control gate, and a MOS transistor of a single gate structure, wherein the method comprises the steps of forming a first insulation film that becomes a gate oxide film of the transistors on a semiconductor substrate; forming a first conductive layer on the first insulation film; removing, from the first conductive layer, a region for separating a floating gate in a direction perpendicular to a direction in which the control gate is formed extendedly; forming a second insulation layer on the first conductive layer; forming a second conductive layer on the second insulation film; patterning the second conductive layer so as to form the control gate; and patterning the first conductive layer to form the stacked gate structure and the single gate structure.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: October 29, 2002
    Assignee: Asahi Kasei Microsystems Co., Ltd.
    Inventors: Fumio Naito, Hisaya Imai, Hidenori Mochizuki