Patents by Inventor Fumio Shishido

Fumio Shishido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6181063
    Abstract: An electron discharge device characterized in having a conductive layer on one surface of a dielectric substrate, a dielectric layer and a conductive layer, in this order, on the other surface of the substrate, wherein the dielectric layer has a thickness equal to or less than 5 nm and a permittivity lower than that of the dielectric substrate. A method for discharging electrons from a surface of a conductive layer (2) by applying voltage between conductive layers (1) and (2) of a device having the conductive layer (1) on one surface of a dielectric substrate, a dielectric layer and the conductive layer (2), in this order, on the other surface of the substrate, wherein the dielectric layer has a thickness equal to or less than 5 nm and a permittivity lower than that of the dielectric substrate, such that a conductive layer (1) serves as a cathode and that the conductive layer (2) serves as an anode.
    Type: Grant
    Filed: July 27, 1999
    Date of Patent: January 30, 2001
    Inventor: Fumio Shishido